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Journal of Applied Physics

Volumn 70, Issue 11, 1991, Pages 7137-7140

A 3-dimensional model for low-pressure chemical-vapor-deposition step coverage in trenches and circular vias

(4) IslamRaja, M Mazhar a Cappelli, M A a McVittie, J P a Saraswat, K C a

a STANFORD UNIVERSITY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0011709019 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.349797 Document Type: Article

Times cited : (72)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.