SPEEDIE. A profile simulator for etching and deposition

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 1392, Issue , 1991, Pages 126-138

  McVittie, J P ^a   Rey, J C ^a   Bariya, A J ^a   IslamRaja, M M ^a   Cheng, L Y ^a   Ravi, S ^a   Saraswat, K C ^a  

^a STANFORD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INTEGRATED CIRCUITS; MATERIALS - CHEMICAL VAPOR DEPOSITION; MATHEMATICAL STATISTICS - MONTE CARLO METHODS;

DRY ETCHING; PROFILE SIMULATORS; SOFTWARE PACKAGE SPEEDIE;

ETCHING;

EID: 0025846777     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (0)