Study of surface reaction probability of cf& Radicals by trench deposition method

Japanese Journal of Applied Physics

Volumn 30, Issue 11R, 1991, Pages 2873-2877

  Yabe, Hideki ^a   Yuuki, Akimasa ^a   Matsui, Yasuji ^a  

^a MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

CF4 Fl2 mixture; CFX radicals; Chemical vapor deposition; In situ FT IR; Sticking (reaction) probability; Trench deposition method

Indexed keywords

ELECTRIC DISCHARGES; PROBABILITY; SURFACES--CHEMICAL REACTIONS;

CARBON COMPOUNDS; STICKING PROBABILITY;

FILMS;

EID: 0026261470     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.30.2873     Document Type: Article

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