SIMULATION OF PLASMA-ASSISTED ETCHING PROCESSES BY ION-BEAM TECHNIQUES.

Journal of vacuum science & technology

Volumn 21, Issue 3, 1982, Pages 757-763

  Mayer, T M ^a   Barker, R A ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

INTEGRATED CIRCUITS, VLSI - MANUFACTURE; ION BEAMS - APPLICATIONS; PLASMAS - APPLICATIONS;

ETCHING;

EID: 0020177218     PISSN: 00225355     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.571821     Document Type: Conference Paper

References (40)