Effect of ion angular distributions on microloading in oxygen reactive-ion etching of submicrometer polymer trenches

Journal of Applied Physics

Volumn 74, Issue 1, 1993, Pages 649-658

  Janes, Joachim ^a   Pilz, Wolfgang ^a  

^a FRAUNHOFER INSTITUTE FOR SILICON TECHNOLOGY ISIT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0040269710     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.355341     Document Type: Article

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