The role of chemisorption in plasma etching

Journal of Applied Physics

Volumn 49, Issue 10, 1978, Pages 5165-5170

  Winters, Harold F ^a  

^a IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON DEVICE MANUFACTURE; INTEGRATED CIRCUIT MANUFACTURE; PLASMAS - APPLICATIONS; SEMICONDUCTOR DEVICE MANUFACTURE;

ETCHING;

EID: 0018026701     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.324411     Document Type: Article

References (19)