Properties of platinum films by liquid-source MOCVD in H2 and O2

Integrated Ferroelectrics

Volumn 42, Issue , 2002, Pages 13-23

  Goswami, J ^a   Majhi, P ^a   Wang, C G ^a   Dey, S K ^a  

^a Arizona State University   (United States)

Author keywords

Liquid source; Metalorganic; MOCVD; Platinum; Thin film

Indexed keywords

ELECTRIC CONDUCTIVITY; ELECTRIC PROPERTIES; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MICROSTRUCTURE; NUCLEATION; PLATINUM COMPOUNDS; SEMICONDUCTOR GROWTH;

GROWTH MECHANISMS; LIQUID-SOURCE MOCVD TECHNIQUE; NUCLEATION DENSITY;

THIN FILMS;

EID: 0013131153     PISSN: 10584587     EISSN: 16078489     Source Type: Conference Proceeding    
DOI: 10.1080/10584580210869     Document Type: Article

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