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Thin Solid Films

Volumn 323, Issue 1-2, 1998, Pages 285-290

Ir and Ru bottom electrodes for (Ba, Sr) TiO3 thin films deposited by liquid delivery source chemical vapor deposition

(7) Lee, Won Jae a,c Basceri, C a Streiffer, S K a Kingon, A I a Yang, Doo Young b Park, Yung c Kim, Ho Gi c

a North Carolina State University (United States)

b Hynix Semiconductor Inc (South Korea)

c Korea Advanced Institute of Science and Technology (KAIST) (South Korea)

Author keywords

Bottom electrode structures; Chemical vapor deposition; Liquid delivery

Indexed keywords

BARIUM TITANATE; FILM PREPARATION; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MORPHOLOGY; SEMICONDUCTING SILICON; SILICA; SPUTTER DEPOSITION; SUBSTRATES; SURFACE ROUGHNESS; THIN FILMS;

BOTTOM ELECTRODE STRUCTURES; LIQUID DELIVERY SOURCE CHEMICAL VAPOR DEPOSITION;

DIELECTRIC FILMS;

EID: 0032099912 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(97)01043-2 Document Type: Article

Times cited : (20)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.