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Thin Solid Films

Volumn 305, Issue 1-2, 1997, Pages 52-60

Effects of reaction kinetics on the microstructure of chemical vapour deposited copper films: Experiment and simulation

(3) Goswami, J a Shivashankar, S A a Anathakrishna, G a,b

a INDIAN INSTITUTE OF SCIENCE (India)

b JAWAHARLAL NEHRU CENTRE FOR ADVANCED SCIENTIFIC RESEARCH (India)

Author keywords

Chemical vapour deposition (CVD); Copper; Microstructure; Monte Carlo simulation

Indexed keywords

COMPUTER SIMULATION; COPPER COMPOUNDS; CRYSTAL MICROSTRUCTURE; ELECTRIC CONDUCTIVITY OF SOLIDS; FILM GROWTH; GRAIN SIZE AND SHAPE; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MONTE CARLO METHODS; PYROLYSIS; REACTION KINETICS; THERMAL EFFECTS;

BUTYLACETOACETATO COPPER; DIPIVALOYLMETHANATO COPPER;

METALLIC FILMS;

EID: 0031212562 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(97)00189-2 Document Type: Article

Times cited : (25)

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