Metalorganic chemical vapor deposition of complex metal oxide thin films by liquid source chemical vapor deposition

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 35, Issue 4 SUPPL. B, 1996, Pages 2520-2525

  Van Buskirk, Peter C ^a   Bilodeau, Steve M ^a   Roeder, Jeffrey F ^a   Kirlin, Peter S ^a  

^a Advanced Technology Materials Inc   (United States)

Author keywords

Ferroelectric; Liquid source CVD; MOCVD; Thin film

Indexed keywords

BARIUM COMPOUNDS; FERROELECTRIC MATERIALS; LEAD COMPOUNDS; STRONTIUM COMPOUNDS; THERMODYNAMIC STABILITY; THIN FILMS; VAPORIZATION;

BARIUM STRONTIUM TITANATE; FLASH VAPORIZATION; LEAD LANTHANUM ZIRCONIUM TITANATE; LIQUID DELIVERY TECHNIQUE; LIQUID SOURCE CHEMICAL VAPOR DEPOSITION; METAL OXIDE THIN FILM; POLARIZATION SWITCHING; STRONTIUM BISMUTH TANTALATE; VOLATILITY;

METALLORGANIC CHEMICAL VAPOR DEPOSITION;

EID: 0030123538     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.2520     Document Type: Article

References (26)

1. P. Kirlin, S. Bilodeau and P. Van Buskirk: Integrated Ferroelectr. 7 (1995) 307.
2. P. C. Van Buskirk, G. T. Stauf, R. A. Gardiner, P. S. Kirlin, B. Bihari and J. Kumar: Mater. Res. Soc. Symp. Proc. 310 (1993) 345.
3. M. De Keijser, G. J. Dormans, P. J. Van Veldhoven and P. K. Larsen: Integrated Ferroelectr. 3 (1993) 131.
4. M. De Keijser, P. J. Van Veldhoven and G. J. M. Dormans: Mater. Res. Symp. Proc. 310 (1993) 223.
5. T. Ami, K. Hironaka, C. Isobe, N. Nagel, M. Sugiyama, Y. Ikeda, K. Watanabe, A. Machida and K. Miura: Mater. Res. Symp. Proc. 415 (1995) p. 123.
6. P. C. Van Buskirk, J. Zhang and P. S. Kirlin: Ferroelectric Thin Film Memories, eds. T. Shiosaki, E. Abe, H. Takeda and H. Tsuya (Science Forum, Tokyo, 1995) p. 123.
7. R. Hiskes, S. A. DiCarolis, J. L. Young, S. S. Laderman, R. D. Jacowitz, and R. C. Taber: Appl. Phys. Lett. 59 (1991) 607.
8. G. Haertling: J. Vac. Sci. & Technol. A 9 (1991) 414.
9. R. A. Gardiner, P. Van Buskirk, P. S. Kirlin: US Patent 5,362,328, 08 (1994).
10. P. S. Kirlin, D. W. Brown and R. A. Gardiner: U.S. Patent 5,453, 494 (1995).
11. J. F.Scott, C. A. Paz de Araujo, L. D.McMillan, H. Yoshimori, H. Watanabe, T. Mihara, M. Azuma, T. Ueda, T. Ueda, D. Ueda and G. Kano: Ferroelectrics 133 (1992) 47.
12. R. M. Brewer: Proc. IEEE VLSI Multilevel Interconnection Conf. (1987) p. 376.
13. W. A. Feil, B. W. Wessels, L. M. Tonge and T. J. Marks: J. Appl. Phys. 67 (1990) 3858.
14. B. S. Kwak, K. Zhang, E. P. Boyd, A. Erbil and B. J. Wilkens: J. Appl. Phys. 69 (1991) 767.
15. P. C. Van Buskirk, R. A. Gardiner and P. S. Kirlin: Evolution of Thin-Film and Surface Microstructure, Mater. Res. Symp. Proc. (1991) p. 235.
16. P. C. Van Buskirk, R. Gardiner, P. S. Kirlin and S. B. Krupanidhi: Proc. 8th Int. Symp. Applications of Ferroelectrics (Greenville, SC 1992) p. 340.
17. T. Kawahara, M. Yamamuka, T. Makita, J. Naka, A. Yuuki, N. Mikami and K. Ono: Jpn. J. Appl. Phys. 33 (1994) 5129.
18. T. Kawahara, M. Yamamuka, T. Makita, K. Tsutahara, A. Yuuki, K. Ono and Y. Matsui: Jpn. J. Appl. Phys. 33 (1994) 5897.
19. T. Horikawa, T. Makita, T. Kuroiwa and N. Mikami: IECE Trans. Electron. E77-C (1994) 385.
20. T. Kuroiwa, T. Horikawa, T. Makita, N. Mikami, K. Namba, S. Mori, N. Uchiyama, I. Schiono, Y. Murakami and T. Shingyoji: to be published in VLSI Symp. Proc. (1995).
21. T. Kuroiwa, Y. Tsunemine, T. Horikawa, T. Makita, J. Tanimura, N. Mikami and K. Sato: Jpn. J. Appl. Phys. 33 (1994) 5187.
22. G. Dietz and R. Waser: to be published in Integ. Ferroelectr. (1995).
23. R. Waser: Proce. 3rd Int. Symp. Integrated Ferroelectr. (1991) 288.
24. B. Jaffe, W. R. Cook Jr. and H. Jaffe: Piezoelectric Ceramics (Academic Press, New York, 1971) pp. 142-143.
25. W. Tao, S. B. Desu, C. H. Peng, B. Dickerson, T. K. Li, C. L. Thio, J. J. Lee and W. Hendricks: Mater. Lett. 23 (1995) 177.
26. K. Ananuma, T. Hase and Y. Miyasaka: Mater. Res. Symp. Proc. 361 (1994) p. 21.