Effect of O2 addition on the deposition of Pt thin films by metallorganic chemical vapor deposition

Journal of the Electrochemical Society

Volumn 145, Issue 3, 1998, Pages 1066-1069

  Lee, Jong Myeong ^a   Hwang, Cheol Seong ^b   Cho, Hag Ju ^b   Suk, Chang Gil ^c   Kim, Hyeong Joon ^a,d  

^a Seoul National University   (South Korea)

^b SAMSUNG Electronics   (South Korea)

^c R and D Center   (South Korea)

^d ELECTROCHEMICAL SOCIETY

Author keywords

[No Author keywords available]

Indexed keywords

COMPLEXATION; GRAIN BOUNDARIES; GRAIN GROWTH; METALLORGANIC CHEMICAL VAPOR DEPOSITION; ORGANOMETALLICS; OXYGEN; PLATINUM;

METAL COMPLEXES; PLATINUM FILMS;

THIN FILMS;

EID: 0032023516     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1838390     Document Type: Article

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