Structure and hydrogen content of stable hot-wire-deposited amorphous silicon

Applied Physics Letters

Volumn 73, Issue 22, 1998, Pages 3244-3246

  Brockhoff, A M ^a   Ullersma, E H C ^a   Meiling, H ^a   Habraken, F H P M ^a   Van Der Weg, W F ^a  

^a UTRECHT UNIVERSITY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000954402     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.122732     Document Type: Article

References (14)

1. D. L. Staebler and C. R. Wronski, Appl. Phys. Lett. 31, 292 (1977).
2. R. A. Street, Physica B 170, 69 (1991).
3. A. H. Mahan, J. Carapella, B. P. Nelson, R. S. Crandall, and I. Balberg, J. Appl. Phys. 69, 6728 (1991).
4. H. Matsumura, J. Appl. Phys. 65, 4396 (1989).
5. M. Heintze, R. Zedlitz, H. N. Wanka, and M. B. Schubert, J. Appl. Phys. 79, 2699 (1996).
6. P. Brogueira, J. P. Conde, S. Arekat, and V. Chu, J. Appl. Phys. 79, 8748 (1996).
7. R. E. I. Schropp, K. F. Feenstra, E. C. Molenbroek, H. Meiling, and J. K. Rath, Philos. Mag. B 76, 309 (1997).
8. H. Meiling and R. E. I. Schropp, Appl. Phys. Lett. 70, 2681 (1997).
9. H. Meiling, A. M. Brockhoff, J. K. Rath, and R. E. I. Schropp, J. Non-Cryst. Solids 227-230, 1202 (1998).
10. W. M. Arnoldbik and F. H. P. M. Habraken, Rep. Prog. Phys. 56, 859 (1993).
11. D. Beeman, R. Tsu, and M. F. Thorpe, Phys. Rev. B 32, 874 (1985).
12. E. Bustarret, M. A. Hachicha, and M. Brunel, Appl. Phys. Lett. 52, 1675 (1988).
13. A. J. M. Berntsen, M. J. van den Boogaard, W. G. J. H. M. van Sark, and W. F. van der Weg, in Amorphous Silicon Technology-1992, edited by M. J. Thompson, Y. Hamakawa, P. G. LeComber, A. Madan, and E. A. Schiff (Materials Research Society, Pittsburgh, 1992), Vol. 258, pp. 275-280.
14. A. H. Mahan, D. L. Williamson, and T. E. Furtak, in Amorphous and Microcrystalline Silicon Technology-1997, edited by S. Wagner, M. Hack, E. A. Schiff, R. Schropp, and I. Shimizu (Materials Research Society, Pittsburgh, 1997), Vol. 467, pp. 657-662.