Dust particle diagnostics in RF plasma deposition of silicon and silicon oxide films (invited)

Materials Research Society Symposium - Proceedings

Volumn 507, Issue , 1999, Pages 547-557

  Hollenstein, Ch ^a   Howling, A A ^a   Courteille, C ^a   Dorier, J L ^a   Sansonnens, L ^a   Magni, D ^a   Muller, H ^a  

^a EPFL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

AMINES; DEPOSITION; MASS SPECTROMETRY; NEGATIVE IONS; PARTICLES (PARTICULATE MATTER); PLASMA DIAGNOSTICS; SEMICONDUCTING SILICON; SILANES; SILICON COMPOUNDS;

PARTICLE-FREE DEPOSITION; SILASESQUIOXANE ANIONS;

SEMICONDUCTING FILMS;

EID: 0032675570     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (36)