Anionic clusters in dusty hydrocarbon and silane plasmas

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 2, 1996, Pages 535-539

  Hollenstein, Ch ^a   Schwarzenbach, W ^b   Howling, A A ^a   Courteille, C ^a   Dorier, J L ^a   Sansonnens, L ^a  

^a EPFL   (Switzerland)

^b Eidgenossische M   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

FREE RADICALS; GLOW DISCHARGES; HYDROCARBONS; MASS SPECTROMETRY; PLASMA CONFINEMENT; PLASMAS; POWDERS; SILANES; STRUCTURE (COMPOSITION);

ANION CLUSTERS; ANION CONFINEMENT; ANIONS; CATIONS; QUADRUPOLE MASS SPECTROMETRY;

IONS;

EID: 0030104632     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580140     Document Type: Article

References (24)

1. A. Garscadden, B. N. Ganguly, P. D. Haaland, and J. Williams, Plasma Sources Sci. Technol. 3, 239 (1994).
2. J. T. Verdeyen, J. Beberman, and L. Overzet, J. Vac. Sci. Technol. A 8, 1851 (1990).
3. P. Haaland, J. Chem. Phys. 93, 4066 (1990).
4. J. Perrin, Ch. Böhm, R. Etemadi, and A. Lloret, Plasma Sources Sci. Technol. 3, 252 (1994).
5. S. J. Choi and M. J. Kushner, J. Appl. Phys. 74, 853 (1993).
6. A. A. Howling, L. Sansonnens, J.-L. Dorier, and Ch. Hollenstein, J. Appl. Phys. 75, 1340 (1994).
7. C. Courteille, J.-L. Dorier, Ch. Hollenstein, L. Sansonnens, and A. A. Howling, Proceedings of the International Union of Vacuum Science, Technology and Applications Workshop, Fuji-Yoshida, September 1995 [Plasma Sources Sci. Technol. (to be published)].
8. C. Courteille, J.-L. Dorier, Ch. Hollenstein, L. Sansonnens, and A. A. Howling, Proceedings of the International Union of Vacuum Science, Technology and Applications Workshop, Fuji-Yoshida, September 1995 [Plasma Sources Sci. Technol. (to be published)].
9. A. A. Howling, C. Courteille, J.-L. Dorier, L. Sansonnens, and Ch. Hollenstein, in Proceedings of the 12th International Symposium Plasma Chemistry, Minneapolis, August 1995 [Pure Appl. Chem. (to be published)].
10. A. A. Howling, C. Courteille, J.-L. Dorier, L. Sansonnens, and Ch. Hollenstein, in Proceedings of the 12th International Symposium Plasma Chemistry, Minneapolis, August 1995 [Pure Appl. Chem. (to be published)].
11. L. J. Overzet, J. H. Beberman, and J. T. Verdeyen, J. Appl. Phys. 66, 1622 (1989).
12. I. Haller, Appl. Phys. Lett. 37, 282 (1980).
13. M. L. Mandich, W. D. Reents, and K. D. Kolenbrander, Pure Appl. Chem. 62, 1653 (1990).
14. A. A. Howling, J.-L. Dorier, and Ch. Hollenstein, Appl. Phys. Lett. 62, 1341 (1993).
15. E. Bertran, J. Costa, G. Sardin, J. Campmany, J. L. Andújar, and A. Canillas, Plasma Sources Sci. Technol. 3, 348 (1994).
16. S. N. Schauer, P. Williams, and R. N. Compton, Phys. Rev. Lett. 65, 625 (1990).
17. E. Hengge, in Silicon Chemistry, edited by E. R. Corey, J. Y. Corey, and P. P. Gaspar (Wiley, New York, 1987), p. 237.
18. Y. Watanabe, M. Shiratani, and H. Makino, Appl. Phys. Lett. 57, 1616 (1990).
19. Ch. Hollenstein, J.-L. Dorier, J. Dutta, L. Sansonnens, and A. A. Howling, Plasma Sources Sci. Technol. 3, 278 (1994).
20. S. Veprek, K. Schopper, O. Ambacher, W. Rieger, and M. G. J. Veprek-Heijman, J. Electrochem. Soc. 140, 1935 (1993).
21. G. M. W. Kroesen, W. W. Stoffels, E. Stoffels, M. Haverlag, J. H. W. G. den Boer, and F. J. de Hoog, Plasma Sources Sci. Technol. 3, 246 (1994); E. Stoffels and W. W. Stoffels, Ph.D. thesis, Eindhoven University of Technology, The Netherlands, 1994.
22. G. M. W. Kroesen, W. W. Stoffels, E. Stoffels, M. Haverlag, J. H. W. G. den Boer, and F. J. de Hoog, Plasma Sources Sci. Technol. 3, 246 (1994); E. Stoffels and W. W. Stoffels, Ph.D. thesis, Eindhoven University of Technology, The Netherlands, 1994.
23. M. Shiratani, T. Fukuzawa, K. Eto, and Y. Watanabe, Jpn. J. Appl. Phys. 31, L1791 (1992).
24. J.-P. Boeuf and L. C. Pitchford, Phys. Rev. E 51, 1376 (1995); Kinema Research Associates simulation of glow discharges rf excited, capacitively coupled (SIGLO-RF) modeling software.