Structural properties of a-Si:H related to ion energy distributions in VHF silane deposition plasmas

Journal of Non-Crystalline Solids

Volumn 226, Issue 3, 1998, Pages 205-216

  Hamers, E A G ^a   Van Sark, W G J H M ^a,b   Bezemer, J ^a   Meiling, H ^a   Van Der Weg, W F ^a  

^a UTRECHT UNIVERSITY   (Netherlands)

^b RADBOUD UNIVERSITY NIJMEGEN   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; ELECTRODES; FILM GROWTH; HYDROGEN BONDS; ION BOMBARDMENT; PLASMA APPLICATIONS; REFRACTIVE INDEX; RESIDUAL STRESSES; SILANES; SURFACE STRUCTURE;

MASS RESOLVED ION ENERGY DISTRIBUTION;

AMORPHOUS FILMS;

EID: 0032094957     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(98)00453-0     Document Type: Article

References (35)

1. W. Luft, Y.S. Tsuo, Hydrogenated Amorphous Silicon Alloy Deposition Processes, Marcel Dekker, New York, 1993.
2. G. Bruno, P. Capezutto, A. Madan (Ed.), Plasma Deposition of Amorphous Silicon-Based Materials, Academic Press, San Diego, CA, 1995.
3. A.I. Kosarev, A.S. Smirnov, A.S. Abramov, A.J. Vinogradov, A.Y. Ustavschikov, M.V. Shutov, J. Vac. Sci. Technol. A 15 (1997) 298.
4. G. Ganguly, T. Ikeda, I. Sakata, A. Matsuda, in: M. Hack, E.A. Schiff, S. Wagner, A. Matsuda, R. Schropp (Eds.), Amorphous Silicon Technology, vol. 420, Material Research Society, Pittsburgh, PA, 1996, p. 347.
5. P. Roca i Cabarrocas, in: A. Madan, M.J. Thompson, P.C. Taylor, Y. Hamakawa, P.G. LeComber (Eds.), Amorphous Silicon Technology, vol. 149, Material Research Society, Pittsburgh, PA, 1989, p. 33.
6. M. Heintze, R. Zedlitz, J. Non-Cryst. Solids 198 (1996) 1038.
7. C. Böhm, J. Perrin, J. Phys. D 24 (1991) 865.
8. J. Perrin, P. Roca i Cabarrocas, B. Allain, J.-M. Friedt, Jpn. J. Appl. Phys. 27 (1988) 2041.
9. J.L. Andújar, E. Bertran, A. Canillas, J.L. Morenza, J. Vac. Sci. Technol. A 9 (1991) 2216.
10. A.A. Fridman, L. Boufendi, T. Hbid, B.V. Potapkin, A. Bouchoule, J. Appl. Phys. 79 (1996) 1303.
11. L. Boufendi, A. Bouchoule, T. Hbid, J. Vac. Sci. Technol. A 14 (1996) 572.
12. H. Curtins, N. Wyrsch, M. Favre, A.V. Shah, Plasma Chem. Plasma Process. 7 (1987) 267.
13. H. Chatham, P. Bhat, A. Benson, C. Matovich, J. Non-Cryst. Solids 115 (1989) 201.
14. A.A. Howling, J.-L. Dorier, C. Hollenstein, U. Kroll, F. Finger, J. Vac. Sci. Technol. A 10 (1992) 1080.
15. M. Heintze, R. Zedlitz, J. Non-Cryst. Solids 164 (1993) 55.
16. J. Dutta, U. Kroll, P. Chabloz, A. Shah, A.A. Howling, J.-D. Dorier, Ch. Hollenstein, J. Appl. Phys. 72 (1992) 3220.
17. C. Beneking, F. Finger, H. Wagner, in: L. Guimarães, W. Palz, C. De Reyff, H. Kiess, P. Helm (Eds.), Eleventh B.C. Photovoltaic Solar Energy Conference, Commision of the European Communities, Harwood Academic, Montreux, Switzerland, 1992, p. 586.
18. W.G.J.H.M. van Sark, J. Bezemer, W.F. van der Weg, J. Mater. Res. 13 (1998) 45.
19. M. Fivaz, S. Brunner, W. Swarzenbach, A.A. Howling, C. Hollenstein, Plasma Sources Sci. Technol. 4 (1995) 373.
20. E.A.G. Hamers, W.G.J.H.M. van Sark, J. Bezemer, W.F. van der Weg, W.J. Goedheer, in: M. Hack, E.A. Schiff, S. Wagner, A. Matsuda, R. Schropp (Eds.), Amorphous Silicon Technology, vol. 420, Material Research Society, Pittsburgh, PA, 1996, p. 461.
21. H. Shanks, C.J. Fang, L. Ley, M. Cardona, F.J. Demond, S. Kalbitzer, Phys. Stat. Sol. B 100 (1980) 43.
22. Hiden Analytical Ltd., 420 Europa Boulevard, Gemini Business Park, Warrington, WA5 5UN, England.
23. E.A.G. Hamers, W.G.J.H.M. van Sark, J. Bezemer, W.J. Goedheer, W.F. van der Weg, Int. J. Mass Spectrom. Ion Processes 173 (1998) 91.
24. C. Wild, P. Koidl, J. Appl. Phys. 69 (1991) 2909.
25. J.K. Hirvonen, Ion beam assisted thin film deposition: Fundamentals and applications of IBAD processing, in: Materials and Processes for Surface and Interface Engineering, Kluwer Academic, Dordrecht, 1995, pp. 307-346.
26. H. Chatham, P.K. Bhat, in: A. Madan, M.J. Thompson, P.C. Taylor, Y. Hamakawa, P.G. Lecomber (Eds.), Amorphous Silicon Technology, vol. 149, Material Research Society, Pittsburgh, PA, 1989, p. 447.
27. B. Chapman, Glow Discharge Processes, Wiley, New York, 1980.
28. J. Perrin, O. Leroy, M.C. Bordage, Contrib. Plasma Phys. 36 (1996) 3.
29. P. Kae-Nune, J. Perrin, J. Guillon, J. Jolly, Plasma Sources Sci. Technol. 4 (1995) 250.
30. M.V.R. Murty, H.A. Atwater, Phys. Rev. B 51 (1995) 4889.
31. S. Vepřek, F.-A. Sarrot, S. Rambert, E. Taglauer, J. Vac. Sci. Technol. A 7 (1989) 2614.
32. J.P. Harbison, A.J. Williams, D.V. Lang, J. Appl. Phys. 55 (1984) 946.
33. K.H. Müller, J. Appl. Phys. 59 (1986) 2803.
34. K.H. Müller, Phys. Rev. B 35 (1987) 7906.
35. J.E. Yehoda, B. Yang, K. Vedam, R. Messier, J. Vac. Sci. Technol. A 6 (1988) 1631.