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Volumn 47, Issue 12, 2000, Pages 2366-2371

Polysilicon quantization effects on the electrical properties of MOS transistors

Author keywords

MOS devices; Mosfets; Quantization; Semiconductor device modeling

Indexed keywords


EID: 0000858448     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/16.887023     Document Type: Article
Times cited : (46)

References (25)
  • 15
    • 0004165928 scopus 로고    scopus 로고
    • C. Y Chang and S. M. Sze, Eds., New York: McGraw-Hill, 1996
    • C. Y Chang and S. M. Sze, Eds., ULSI Technology. New York: McGraw-Hill, 1996.
    • ULSI Technology.
  • 22
    • 0032680955 scopus 로고    scopus 로고
    • "Estimating oxide thickness of tunnel oxides down to 1.4 nm using conventional capacitance-voltage measurements on MOS capacitors," IEEE Electron Device Lett., vol. 20, pp. 179-181, Apr. 1999
    • W. K. Henson et al., "Estimating oxide thickness of tunnel oxides down to 1.4 nm using conventional capacitance-voltage measurements on MOS capacitors," IEEE Electron Device Lett., vol. 20, pp. 179-181, Apr. 1999.
    • Henson, W.K.1
  • 24
    • 84988780867 scopus 로고    scopus 로고
    • Fundamentals of Solid State Electronics, Singapore: World Scientific, 1991
    • C. T. Sah, Fundamentals of Solid State Electronics, Singapore: World Scientific, 1991.
    • Sah, C.T.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.