Magnetic field argon ion filtering for pulsed magnetron sputtering growth of two-dimensional MoS2

Surface and Coatings Technology

Volumn 280, Issue , 2015, Pages 260-267

  Voevodin, Andrey A ^a   Waite, Adam R ^a,b   Bultman, John E ^a,c   Hu, Jianjun ^a,c   Muratore, Christopher ^a,d  

^a AIR FORCE RESEARCH LABORATORY   (United States)

^b UNIVERSAL TECHNOLOGY CORPORATION   (United States)

^c UNIVERSITY OF DAYTON RESEARCH INSTITUTE   (United States)

^d UNIVERSITY OF DAYTON   (United States)

Author keywords

Magnetic filtering; Plasma characterization; Pulsed sputtering; Two dimensional film growth

Indexed keywords

ARGON; D REGION; FILM GROWTH; ION BOMBARDMENT; IONIZATION; KINETIC ENERGY; LAYERED SEMICONDUCTORS; MAGNETIC FIELDS; MAGNETIC FILTERS; MAGNETRON SPUTTERING; MASS SPECTROMETRY; MOLYBDENUM; MOLYBDENUM COMPOUNDS; NANOCRYSTALLINE MATERIALS; PHYSICAL VAPOR DEPOSITION; PLASMA DIAGNOSTICS; POSITIVE IONS;

CONDENSATION SURFACE; ELECTRON AND ION DENSITIES; PHYSICAL VAPOR DEPOSITION PROCESS; PLASMA CHARACTERIZATION; PLASMA-ASSISTED GROWTH; PULSED MAGNETRON SPUTTERING; PULSED SPUTTERING; TWO DIMENSIONAL (2 D);

MAGNETOPLASMA;

EID: 84944212825     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2015.09.013     Document Type: Article

References (50)

1. Novoselov K.S., Jiang D., Schedin F., Booth T.J., Khotkevich V.V., Morozov S.V., Geim A.K. Proc. Natl. Acad. Sci. U. S. A. 2005, 102:10451.
2. Geim A.K., Grigorieva I.V. Nature 2013, 499:419.
3. Akinwande D., Petrone N., Hone J. Nat. Commun. 2014, 5:5678.
4. Fiori G., Bonaccorso F., Iannaccone G., Palacios T., Neumaier D., Seabaugh A., Banerjee S.K., Colombo L. Nat. Nanotechnol. 2014, 9:768.
5. Cao C., Sun Y., Filleter T. J. Mater. Res. 2014, 29:338.
6. Lin Y.C., Zhang W., Huang J.K., Liu K.K., Lee Y.H., Liang C.T., Chu C.W., Li L.J. Nanoscale 2012, 4:6637.
7. Zhan Y., Liu Z., Najmaei S., Ajayan P.M., Lou J. Small 2012, 8:966.
8. van der Zande A.M., Huang P.Y., Chenet D.A., Berkelbach T.C., You Y., Lee G.H., Heinz T.F., Reichman D.R., Muller D.A., Hone J.C. Nat. Mater. 2013, 12:554.
9. Wang X., Feng H., Wu Y., Jiao L. J. Am. Chem. Soc. 2013, 135:5304.
10. Wang S., Rong Y., Fan Y., Pacios M., Bhaskaran H., He K., Warner J.H. Chem. Mater. 2014, 26:6371.
11. Jeon J., Jang S.K., Jeon S.M., Yoo G., Jang Y.H., Park J.H., Lee S. Nanoscale 2015, 7:1688.
12. Browning P., Eichfeld S., Kehao Z., Hossain L., Lin Y.-C., Wang K., Lu N., Waite A.R., Voevodin A.A., Kim M., Robinson J.A. 2D Materials 2015, 2:014003.
13. Martin P.M. Handbook of Deposition Technologies for Films and Coatings 2010, 1-912. William Andrew Publishing, Boston.
14. Spalvins T. Thin Solid Films 1982, 96:17.
15. Lince J.R., Fleischauer P.D. J. Mater. Res. 1987, 2:827.
16. Donley M.S., McDevitt N.T., Haas T.W., Murray P.T., Grant J.T. Thin Solid Films 1989, 168:335.
17. Moser J., Liao H., Levy F. J. Phys. D. Appl. Phys. 1990, 23:624.
18. Walck S.D., Donley M.S., Zabinski J.S., Dyhouse V.J. J. Mater. Res. 1993, 8:2933.
19. McDevitt N.T., Zabinski J.S., Donley M.S. Thin Solid Films 1994, 240:76.
20. Prasad S.V., Zabinski J.S., Dyhouse V.J. J. Mater. Sci. Lett. 1992, 11:1282.
21. Ballif C., Regula M., Remskar M., Sanjines R., Levy F. Surf. Sci. 1996, 366:703.
22. Regula M., Ballif C., Moser J.H., Levy F. Thin Solid Films 1996, 280:67.
23. Ballif C., Regula M., Schmid P.E., Remskar M., Sanjines R., Levy F. Appl. Phys. A Mater. Sci. Process. 1996, 62:543.
24. Weiß V., Seeger S., Ellmer K. J. Appl. Phys. 2007, 101:103502.
25. Grigoriev S.N., Fominski V.Y., Gnedovets A.G., Romanov R.I. Appl. Surf. Sci. 2012, 258:7000.
26. Day Allan E., Laube Samuel J.P., Donley M.S., Zabinski J.S. Optimization of niobium diselenide thin films through control of pulsed laser deposition parameters. Materials Research Society Symposium Proceedings 1993, 539-544. Publ by Materials Research Society, Boston.
27. Ostrikov K., Neyts E.C., Meyyappan M. Adv. Phys. 2013, 62:113.
28. Muratore C., Voevodin A.A. Thin Solid Films 2009, 517:5605.
29. Muratore C., Varshney V., Gengler J.J., Hu J.J., Bultman J.E., Smith T.M., Shamberger P.J., Qiu B., Ruan X., Roy A.K., Voevodin A.A. Appl. Phys. Lett. 2013, 102:081604.
30. Muratore C., Hu J.J., Wang B., Haque M.A., Bultman J.E., Jespersen M.L., Shamberger P.J., McConney M.E., Naguy R.D., Voevodin A.A. Appl. Phys. Lett. 2014, 104:261604.
31. Wang B., Muratore C., Voevodin A.A., Haque M.A. Nano Converg. 2014, 1:1.
32. Tao J., Chai J., Lu X., Wong L.M., Wong T.I., Pan J., Xiong Q., Chi D., Wang S. Nanoscale 2015, 7:2497.
33. Komsa H.P., Kurasch S., Lehtinen O., Kaiser U., Krasheninnikov A.V. Phys. Rev. B 2013, 88:035301.
34. Aksenov I.I., Belous V.A., Padalka V.G., Khoroshikh V.M. Sov. J. Plasma Phys. 1978, 4:425.
35. Boxman R.L., Zhitomirsky V., Alterkop B., Gidalevich E., Beilis I.I., Keidar M., Goldsmith S. Surf. Coat. Technol. 1996, 86-87:243.
36. Anders A. Surf. Coat. Technol. 1999, 120-121:319.
37. Sanders D.M., Anders A. Surf. Coat. Technol. 2000, 133-134:78.
38. Petrov I., Adibi F., Greene J.E., Sproul W.D., Munz W.D. J. Vac. Sci. Technol. A 1992, 10:3283.
39. Petrov I., Adibi F., Greene J.E., Hultman L., Sundgren J.E. Appl. Phys. Lett. 1993, 63:36.
40. Solov'ev A.A., Sochugov N.S., Oskomov K.V., Rabotkin S.V. Plasma Phys. Rep. 2009, 35:399.
41. Muratore C., Walton S.G., Leonhardt R.F., Fernsler R.F. J. Vac. Sci. Technol. A 2006, 24:25.
42. Glavin N.R., Muratore C., Jespersen M.L., Hu J., Fisher T.S., Voevodin A.A. J. Appl. Phys. 2015, 117:165305.
43. Window B., Savvides N. J. Vac. Sci. Technol. A 1986, 4:196.
44. Aksenov I.I., Belous V.A., Padalka V.G., Khoroshikh V.M. Instrum. Exp. Tech. 1978, 21:1416.
45. Bradley J.W., Bäcker H., Aranda-Gonzalvo Y., Kelly P.J., Arnell R.D. Plasma Sources Sci. Technol. 2002, 11:165.
46. Walton S.G., Leonhardt D., Fernsler R.F., Meger R.A. Appl. Phys. Lett. 2003, 83:626.
47. De Hoffmann E., Stroobant V. Mass Spectrometry: Principles and Applications 2013, 1-502. John Wiley and Sons, New York.
48. Francombe M.H., Vossen J.L. Plasma Sources for Thin Film Deposition and Etching, Physics of Thin Films Volume 18 1994, 1-328. Academic Press, San Diego.
49. Smith K.C., Saenz D.A., Zemlyanov D., Voevodin A.A. XPS Thickness Solver 2014, (archived at: https://nanohub.org/resources/xpsts). 10.4231/D3FJ29D7X.
50. Lee C., Yan H., Brus L.E., Hentz T.F., Hone J., Ryu S. ACS Nano 2010, 4:2695.