Experimental and numerical study of the chemical composition of WSe x thin films obtained by pulsed laser deposition in vacuum and in a buffer gas atmosphere

Applied Surface Science

Volumn 258, Issue 18, 2012, Pages 7000-7007

  Grigoriev, S N ^a   Fominski, V Yu ^b   Gnedovets, A G ^c   Romanov, R I ^b  

^a MOSCOW STATE UNIVERSITY OF TECHNOLOGY STANKIN   (Russian Federation)

^b NATIONAL RESEARCH NUCLEAR UNIVERSITY MEPHI   (Russian Federation)

^c BAIKOV INSTITUTE OF METALLURGY AND MATERIALS SCIENCE   (Russian Federation)

Author keywords

Chemical composition; Laser plume dynamics; Monte Carlo simulations; Pulsed laser deposition; Selective sputtering; Tungsten diselenide thin films

Indexed keywords

ARGON LASERS; ATOM LASERS; ATOMS; INTELLIGENT SYSTEMS; LASER CHEMISTRY; MONTE CARLO METHODS; PULSED LASER DEPOSITION; PULSED LASERS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SELENIUM; SELENIUM COMPOUNDS; SPUTTERING; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

CHEMICAL COMPOSITIONS; EXPERIMENTAL AND NUMERICAL STUDIES; LASER PLUMES; RUTHERFORD BACK-SCATTERING SPECTROMETRY; SELECTIVE SPUTTERING; STOICHIOMETRIC COEFFICIENTS; TIME OF FLIGHT MEASUREMENTS; TUNGSTEN DISELENIDE;

TUNGSTEN COMPOUNDS;

EID: 84861101869     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2012.03.153     Document Type: Article

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