Control of molybdenum disulfide basal plane orientation during coating growth in pulsed magnetron sputtering discharges

Thin Solid Films

Volumn 517, Issue 19, 2009, Pages 5605-5610

  Muratore, C ^a   Voevodin, A A ^a  

^a AIR FORCE RESEARCH LABORATORY   (United States)

Author keywords

Molybdenum disulfide; Pulsed sputtering; Tribology

Indexed keywords

ATOMIC LAYER; BASAL PLANES; COATING GROWTH; DESORPTION RATE; GROWTH MECHANISMS; HIGH ENERGY ION BOMBARDMENT; HUMID AIR; ION ENERGIES; LOW GROWTH RATE; MID-FREQUENCY; MOLYBDENUM DISULFIDE; ORIENTATION RATIO; PULSED DEPOSITION; PULSED DIRECT CURRENT; PULSED MAGNETRON SPUTTERING; PULSED SPUTTERING; RE-SPUTTERING; SLIDING WEAR TESTS; TRIBOLOGICAL PERFORMANCE;

ADSORPTION; ATOMS; COATINGS; CRYSTAL ORIENTATION; DESORPTION; GRAIN BOUNDARIES; IONS; MOLYBDENUM; MOLYBDENUM COMPOUNDS; MONOLAYERS; SURFACE DIFFUSION; SURFACES; TRIBOLOGY;

ION BOMBARDMENT;

EID: 66049086533     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.01.190     Document Type: Article

References (38)

1. Glocker D.A. J. Vac. Sci. Technol. A 11 (1993) 2989
2. Kelly P.J., Abu-Zeid O.A., Arnell R.D., and Tong J. Surf. Coat. Technol. 86-87 (1996) 28
3. Sproul W.D., Graham M.E., Wong M.S., Lopez S., Li D., and Scholl R.A. J. Vac. Sci. Technol. A 13 (1995) 1188
4. Cooke K.E., Goodyear A., Hampshire J., and Teer D.G. Surf. Coat. Technol. 188-189 (2004) 750
5. Henderson P.S., Kelly P.J., Arnell R.D., Backer H., and Bradley J.W. Surf. Coat. Technol. 174-175 (2003) 779
6. Muratore C., Moore J.J., and Rees J.A. Surf. Coat. Technol. 163-164 (2003) 12
7. Bradley J.W., Backer H., Aranda-Gonzalez Y., Kelly P.J., and Arnell R.D. Plasma Sources Sci. Technol. 11 (2002) 165
8. Kelly P.J., Onifade A.A., Zhou Y., Clarke C.B., Audronis M., and Bradley J.W. Plasma Process. Polym. 4 (2007) 246
9. Stupp B.C. Thin Solid Films 84 (1981) 257
10. Aubert A., Nabot J.P., Ernoult J., and Renaux P. Surf. Coat. Technol. 41 (1990) 127
11. Hilton M.R., Bauer R., and Fleischauer P.D. Thin Solid Films 188 (1990) 219236
12. Lauwerens W., Wang J., Navratil J., Wieers E., D'haen J., Stals L.M., Celis J.P., and Bruynseraede Y. Surf. Coat. Technol. 131 (2000) 216
13. Moser J., and Levy F. J. Mater. Res. 8 (1993) 206
14. Fleischauer P.D. ASLE Trans. 27 (1984) 82
15. Matsunaga M., and Nakagawa T. ASLE Proc. 2nd Intl. Conf. Solid Lubr (1978) 45
16. Roxlo C.B., Deckman H.W., Gland J., Cameraon S.D., and Chianelli R.R. Science 235 (1987) 1629
17. Sun M., Adjaye J., and Nelson A.E. Appl. Catal. A 263 (2004) 131
18. Gourmelon E., Bernede J.C., Pouzet J., and Sorensen G. Phys. Status Solidi A 161 (1997) R5
19. Ponomarev E.A., Tenne R., Katty A., and Lθvy-Clθment C. Sol. Energy Mater. Sol. Cells 52 (1998) 125
20. Chiritescu C., Cahill D.G., Nguyen N., Johnson D., Bodapati A., Keblinski P., and Zschack P. Science 315 (2007) 351
21. Moser J., Levy F., and Bussy F. J. Vac. Sci. Technol. A 12 (1994) 494
22. Weise G., Mattern N., Herman H., Teresiak A., Bacher I., Bruckner W., Bauer H.-D., Vinzelberg H., Reiss G., Kreissig U., Mader M., and Markschlager P. Thin Solid Films 298 (1997) 98
23. Buck V. Wear 91 (1983) 281
24. Spalvins T. Thin Solid Films 73 (1980) 291
25. Teer D.G., Hampshire J., Fox V., and Bellido-Gonzalez V. Surf. Coat. Technol. 94-95 (1997) 572
26. Seitzman L.E., Bolster R.N., and Singer I.L. Thin Solid Films 260 (1995) 143
27. Gardos M.N. Tribol. Lett. 1 (1995) 67
28. Moser J., and Levy F. Thin Solid Films 228 (1993) 257
29. Bohlmark J., Lattemann M., Gudmundsson J.T., Ehiasarian A.P., randa Gonzalvo Y., Brenning N., and Helmersson U. Thin Solid Films 515 (2006) 1522
30. Kadlec S., Quaeyhaegens C., Knuyt G., and Stals L.M. Surf. Coat. Technol. 89 (1997) 177
31. Moser J., Liao H., and Levy F. J. Phys. D Appl. Phys. 23 (1990) 624
32. Spirko J.A., Neiman M.L., Oelker A.M., and Klier K. Surf. Sci. 542 (2003) 192
33. Smith D.L. Thin Film Deposition (1995), McGraw-Hill, Boston, MA 119-136
34. Baldinger Th., and Bechtold E. Surf. Sci. 159 (1985) 406
35. Sorescu D.C., Sholl D.S., and Cugini A.V. J. Phys. Chem. B 108 (2004) 239
36. Lieberman M.A., and Lichtenberg A.J. Principles of Plasma Discharges and Materials Processing (1994), John Wiley & Sons, New York 11-12
37. Coburn J.W., and Kay E. J. Vac. Sci. Technol. 43 (1972) 4965
38. Yamamura Y., and Tawara H. At. Data Nucl. Data Tables 62 (1996) 149