Chemical Vapor Deposition Synthesized Atomically Thin Molybdenum Disulfide with Optoelectronic-Grade Crystalline Quality

ACS Nano

Volumn 9, Issue 9, 2015, Pages 8822-8832

  Bilgin, Ismail ^a,b   Liu, Fangze ^a   Vargas, Anthony ^a   Winchester, Andrew ^c,d   Man, Michael K L ^d   Upmanyu, Moneesh ^e   Dani, Keshav M ^d   Gupta, Gautam ^b   Talapatra, Saikat ^c,d   Mohite, Aditya D ^b   Kar, Swastik ^a  

^a NORTHEASTERN UNIVERSITY   (United States)

^b LOS ALAMOS NATIONAL LABORATORY   (United States)

^c SOUTHERN ILLINOIS UNIVERSITY   (United States)

^d OKINAWA INSTITUTE OF SCIENCE AND TECHNOLOGY GRADUATE UNIVERSITY   (Japan)

^e Northeastern University   (United States)

Author keywords

chemical vapor deposition; exciton dissociation; monolayer MoS2< inf>; photocurrent spectroscopy; photoluminescence; Raman

Indexed keywords

CRYSTALLINE MATERIALS; DEPOSITION; GROWTH (MATERIALS); MOLYBDENUM COMPOUNDS; MONOLAYERS; PASSIVATION; PHOTOLUMINESCENCE; SEMICONDUCTOR QUANTUM WELLS; SINGLE CRYSTALS; SUBSTRATES; VAPOR DEPOSITION;

CHEMICAL VAPOR DEPOSITION METHODS; EXCITON DISSOCIATION; HIGH QUALITY SINGLE CRYSTALS; HIGH-CRYSTALLINE QUALITY; PHOTOCURRENT SPECTROSCOPY; PHOTOLUMINESCENCE MAPPING; RAMAN; VAPOR PHASE SULFURIZATION;

CHEMICAL VAPOR DEPOSITION;

EID: 84942317866     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/acsnano.5b02019     Document Type: Article

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