Strong light-matter interactions in heterostructures of atomically thin films

Science

Volumn 340, Issue 6138, 2013, Pages 1311-1314

  Britnell, L ^a   Ribeiro, R M ^b,c   Eckmann, A ^a   Jalil, R ^a   Belle, B D ^a   Mishchenko, A ^a   Kim, Y J ^a,d   Gorbachev, R V ^a   Georgiou, T ^a   Morozov, S V ^e   Grigorenko, A N ^a   Geim, A K ^a   Casiraghi, C ^a,f   Castro Neto, A H ^b,g   Novoselov, K S ^a  

^a UNIVERSITY OF MANCHESTER   (United Kingdom)

^b NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^c UNIVERSITY OF MINHO   (Portugal)

^d Seoul National University   (South Korea)

^e INSTITUTE OF MICROELECTRONICS TECHNOLOGY AND HIGH PURITY MATERIALS   (Russian Federation)

^f FREIE UNIVERSITÄT BERLIN   (Germany)

^g Boston University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BORON NITRIDE NANOTUBE; CHALCOGEN; GRAPHENE;

ABSORPTION; CARBON; CRYSTAL STRUCTURE; ELECTRONIC EQUIPMENT; PHOTOVOLTAIC SYSTEM; TRANSITION ELEMENT; TWO-DIMENSIONAL MODELING;

ARTICLE; ATOM; COVALENT BOND; ELECTRICAL CONDUCTIVITY PARAMETERS; ELECTRICAL EQUIPMENT; ELECTRON; ELECTRONICS; LIGHT ABSORPTION; PHOTOVOLTAIC DEVICE; PRIORITY JOURNAL;

EID: 84878942676     PISSN: 00368075     EISSN: 10959203     Source Type: Journal    
DOI: 10.1126/science.1235547     Document Type: Article

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