Direct and Scalable Deposition of Atomically Thin Low-Noise MoS2 Membranes on Apertures

ACS Nano

Volumn 9, Issue 7, 2015, Pages 7352-7359

  Waduge, Pradeep ^a   Bilgin, Ismail ^a   Larkin, Joseph ^a   Henley, Robert Y ^a   Goodfellow, Kenneth ^b   Graham, Adam C ^c   Bell, David C ^c   Vamivakas, Nick ^b   Kar, Swastik ^a   Wanunu, Meni ^a  

^a NORTHEASTERN UNIVERSITY   (United States)

^b UNIVERSITY OF ROCHESTER   (United States)

^c HARVARD UNIVERSITY   (United States)

Author keywords

2D materials; dichalcogenides; DNA; MoS2; nanopores; transfer free

Indexed keywords

CRYSTAL ATOMIC STRUCTURE; DNA; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; LAYERED SEMICONDUCTORS; MEMBRANES; MOLYBDENUM COMPOUNDS; NANOPORES; PHOTOLUMINESCENCE SPECTROSCOPY; SILICON NITRIDE; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY;

ATOMIC RESOLUTION; DICHALCOGENIDES; MICROMETER SCALE; MOLYBDENUM DISULFIDE; MOS2; SILICON NITRIDE MEMBRANE; SINGLE-STRANDED DNA; TRANSFER-FREE;

SULFUR COMPOUNDS;

ARTIFICIAL MEMBRANE; MOLYBDENUM; SILICON; SINGLE STRANDED DNA; SULFATE;

ARTIFICIAL MEMBRANE; CHEMISTRY; NANOPORE;

DNA, SINGLE-STRANDED; MEMBRANES, ARTIFICIAL; MOLYBDENUM; NANOPORES; SILICON; SULFATES;

EID: 84938154157     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/acsnano.5b02369     Document Type: Article

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