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Volumn 9783709104248, Issue , 2012, Pages 143-161

Atomic layer deposition for nanotechnology

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION; CHEMICAL VAPOR DEPOSITION; DEPOSITION; INTEGRATED CIRCUITS; NANOTECHNOLOGY; THICK FILMS; THIN FILMS; YARN;

EID: 84930894669     PISSN: None     EISSN: None     Source Type: Book    
DOI: 10.1007/978-3-7091-0424-8_6     Document Type: Chapter
Times cited : (10)

References (48)
  • 12
    • 84930895564 scopus 로고    scopus 로고
    • Ph.D. Thesis, Harvard University
    • Hausmann D, Ph.D. Thesis, Harvard University (2002
    • (2002)
    • Hausmann, D.1
  • 15
    • 84930918922 scopus 로고    scopus 로고
    • SAFC Hitech Technical Bulletin New hafnium oxiDe ALD precursors
    • SAFC Hitech Technical Bulletin New hafnium oxiDe ALD precursors, http://www.safcglobal.com/safc-hitech/en-us/home/overview/technical-library.html
  • 29
  • 32
    • 84889303235 scopus 로고    scopus 로고
    • High K metal gate press foils Nov
    • Intel Corporation, High K metal gate press foils, Nov. 2003
    • (2003) Intel Corporation


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.