Atomic layer deposition: An enabling technology for microelectronic device manufacturing

ASMC (Advanced Semiconductor Manufacturing Conference) Proceedings

Volumn , Issue , 2007, Pages 359-365

  Lee, Fourmun ^a   Marcus, Steve ^a   Shero, Eric ^a   Wilk, Glen ^a   Swerts, Johan ^a   Maes, Jan Willem ^a   Blomberg, Tom ^a   Delabie, Annelies ^b   Gros Jean, Mickael ^c   Deloffre, Emilie ^c  

^a ASM AMERICA   (United States)

^b IMEC   (Belgium)

^c STMICROELECTRONICS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION; ELECTRIC PROPERTIES; FABRICATION; MAGNETIC HEADS; STACKING FAULTS; ULTRATHIN FILMS;

GATE STACKS; MICROELECTRONIC DEVICE FABRICATION; THIN FILM MAGNETIC HEADS;

MICROELECTRONICS;

EID: 34748890430     PISSN: 10788743     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ASMC.2007.375064     Document Type: Conference Paper

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