Residual metallic contamination of transferred chemical vapor deposited graphene

ACS Nano

Volumn 9, Issue 5, 2015, Pages 4776-4785

  Lupina, Grzegorz ^a   Kitzmann, Julia ^a   Costina, Ioan ^a   Lukosius, Mindaugas ^a   Wenger, Christian ^a   Wolff, Andre ^a   Vaziri, Sam ^b   Östling, Mikael ^b   Pasternak, Iwona ^c   Krajewska, Aleksandra ^c   Strupinski, Wlodek ^c   Kataria, Satender ^d   Gahoi, Amit ^d   Lemme, Max C ^d   Ruhl, Guenther ^e   Zoth, Guenther ^e   Luxenhofer, Oliver ^e   Mehr, Wolfgang ^a  

^a IHP   (Germany)

^b ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

^c ukasiewicz Research Network Institute of Microelectronics and Photonics   (Poland)

^d UNIVERSITY OF SIEGEN   (Germany)

^e INFINEON TECHNOLOGIES AG   (Germany)

Author keywords

CVD graphene; metallic contaminations; ToF SIMS; transfer; TXRF

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CONTAMINATION; COPPER; DEPTH PROFILING; MASS SPECTROMETRY; METALS; MICROELECTRONICS; SECONDARY ION MASS SPECTROMETRY; SILICON; SILICON WAFERS;

CVD GRAPHENE; METALLIC CONTAMINATION; TOF SIMS; TRANSFER; TXRF;

GRAPHENE;

EID: 84930638459     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/acsnano.5b01261     Document Type: Article

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