Plasma monitoring and PECVD process control in thin film silicon-based solar cell manufacturing

EPJ Photovoltaics

Volumn 5, Issue , 2014, Pages

  Gabriel, Onno ^a   Kirner, Simon ^a   Klick, Michael ^b   Stannowski, Bernd ^a   Schlatmann, Rutger ^a  

^a HAHN MEITNER INSTITUT   (Germany)

^b Plasmetrex GmBH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DRUG PRODUCTS; INDUSTRIAL EMISSIONS; MASS SPECTROMETRY; OPTICAL EMISSION SPECTROSCOPY; PLASMA DIAGNOSTICS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON; SILICON SOLAR CELLS; SOLAR CELLS; THIN FILM SOLAR CELLS; THIN FILMS;

CHAMBER WALL TEMPERATURE; CHAMBER WALLS; DEPOSITION PROCESS; ELECTRON DYNAMICS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITIONS (PE CVD); SOLAR CELL MANUFACTURING; SOLAR CELL PERFORMANCE; THIN FILM SILICON;

PLASMA CVD;

EID: 84921777613     PISSN: None     EISSN: 21050716     Source Type: Journal    
DOI: 10.1051/epjpv/2013028     Document Type: Article

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