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Volumn 22, Issue 7, 2007, Pages 1767-1774

Hidden parameters in the plasma deposition of microcrystalline silicon solar cells

Author keywords

[No Author keywords available]

Indexed keywords

DILUTION; FLOW OF GASES; FLOW RATE; HYDROGEN; MICROCRYSTALLINE SILICON; PLASMA DEPOSITION; SUBSTRATES; THERMAL GRADIENTS;

EID: 34547123333     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/jmr.2007.0226     Document Type: Conference Paper
Times cited : (11)

References (20)
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    • The generation of high-density microwave plasma and its application to large-area microcrystalline silicon thin film formation
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    • Shirai, H.1    Arai, T.2    Ueyama, H.3
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    • Structural properties of microcrystalline silicon in the transition from highly crystalline to amorphous growth
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    • (1998) Philos. Mag. A , vol.77 , pp. 1447
    • Houben, L.1    Luysberg, M.2    Hapke, P.3    Carius, R.4    Finger, F.5    Wagner, H.6
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    • Influence of the total gas flow on the deposition of microcrystalline silicon solar cells
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    • Comprehensive study of microcrystalline silicon solar cells deposited at high rate using 13.56 MHz plasma-enhanced chemical vapor deposition
    • T. Roschek, T. Repmann, J. Müller, B. Rech, and H. Wagner: Comprehensive study of microcrystalline silicon solar cells deposited at high rate using 13.56 MHz plasma-enhanced chemical vapor deposition. J. Vac. Sci. Technol. A 20, 492 (2002).
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.