Probing the phase composition of silicon films in situ by etch product detection

Applied Physics Letters

Volumn 91, Issue 16, 2007, Pages

  Dingemans, G ^d   Van Den Donker, M N ^a   Gordijn, A ^b   Kessels, W M M ^c   Van De Sanden, M C M ^c  

^a Solland Solar Cells BV   (Netherlands)

^b FORSCHUNGSZENTRUM JÜLICH   (Germany)

^c EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^d NONE

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL GROWTH; ETCHING; FILM THICKNESS; MICROCRYSTALLINE SILICON; OPTICAL EMISSION SPECTROSCOPY; PHASE COMPOSITION;

CRYSTALLINE SILICON; ETCH PRODUCTS; MICROCRYSTALLINE GROWTH; SILICON FILMS;

AMORPHOUS FILMS;

EID: 35549003150     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2799738     Document Type: Article

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