-
1
-
-
84914176453
-
-
U.S. Patent 4 058 430.
-
Suntola, T.; Antson, J. U.S. Patent 4 058 430, 1977.
-
(1977)
-
-
Suntola, T.1
Antson, J.2
-
2
-
-
84857184596
-
Atomic Layer Deposition of Aluminum Oxide Films for Carbon Nanotube Network Transistor Passivation
-
Grigoras, K.; Zavodchikova, M. Y.; Nasibulin, A. G.; Kauppinen, E. I.; Ermolov, V.; Franssila, S. Atomic Layer Deposition of Aluminum Oxide Films for Carbon Nanotube Network Transistor Passivation J. Nanosci. Nanotechnol. 2011, 11, 8818-8825
-
(2011)
J. Nanosci. Nanotechnol.
, vol.11
, pp. 8818-8825
-
-
Grigoras, K.1
Zavodchikova, M.Y.2
Nasibulin, A.G.3
Kauppinen, E.I.4
Ermolov, V.5
Franssila, S.6
-
3
-
-
79957608920
-
An Atomic Layer Deposition Process for Moving Flexible Substrates
-
Maydannik, P. S.; Kaariainen, T. O.; Cameron, D. C. An Atomic Layer Deposition Process for Moving Flexible Substrates Chem. Eng. J. 2011, 171, 345-349
-
(2011)
Chem. Eng. J.
, vol.171
, pp. 345-349
-
-
Maydannik, P.S.1
Kaariainen, T.O.2
Cameron, D.C.3
-
4
-
-
84855580082
-
Evaluating Operating Conditions for Continuous Atmospheric Atomic Layer Deposition Using a Multiple Slit Gas Source Head
-
Ryan Fitzpatrick, P.; Gibbs, Z. M.; George, S. M. Evaluating Operating Conditions for Continuous Atmospheric Atomic Layer Deposition Using a Multiple Slit Gas Source Head J. Vac. Sci. Technol. A 2012, 30, 01A136
-
(2012)
J. Vac. Sci. Technol. A
, vol.30
, pp. 01A136
-
-
Ryan Fitzpatrick, P.1
Gibbs, Z.M.2
George, S.M.3
-
5
-
-
4444261663
-
Atomic Layer Deposition of Insulating Hafnium and Zirconium Nitrides
-
Becker, J. S.; Kim, E.; Gordon, R. G. Atomic Layer Deposition of Insulating Hafnium and Zirconium Nitrides Chem. Mater. 2004, 16, 3497-3501
-
(2004)
Chem. Mater.
, vol.16
, pp. 3497-3501
-
-
Becker, J.S.1
Kim, E.2
Gordon, R.G.3
-
6
-
-
0242583886
-
Atomic Layer Deposition of Transition Metals
-
Lim, B. S.; Rahtu, A.; Gordon, R. G. Atomic Layer Deposition of Transition Metals Nat. Mater. 2003, 2, 749-754
-
(2003)
Nat. Mater.
, vol.2
, pp. 749-754
-
-
Lim, B.S.1
Rahtu, A.2
Gordon, R.G.3
-
7
-
-
84897106723
-
3 Thin Films Fabricated through Atomic Layer Deposition on Polymeric Substrates
-
3 Thin Films Fabricated through Atomic Layer Deposition on Polymeric Substrates J. Mater. Sci. Mater. Electron. 2014, 16, 1922-1932
-
(2014)
J. Mater. Sci. Mater. Electron.
, vol.16
, pp. 1922-1932
-
-
Ali, K.1
Kim, C.Y.2
Choi, K.-H.3
-
8
-
-
84870299424
-
2 Layer through Electrohydrodynamic Atomization for the Printed Resistive Switch (memristor)
-
2 Layer through Electrohydrodynamic Atomization for the Printed Resistive Switch (memristor) Microelectron. Eng. 2013, 103, 167-172
-
(2013)
Microelectron. Eng.
, vol.103
, pp. 167-172
-
-
Awais, M.N.1
Muhammad, N.M.2
Navaneethan, D.3
Kim, H.C.4
Jo, J.5
Choi, K.H.6
-
9
-
-
0038147240
-
Silicon for Thin-Film Transistors
-
Wagner, S.; Gleskova, H.; Cheng, I.-C.; Wu, M. Silicon for Thin-Film Transistors Thin Solid Films 2003, 430, 15-19
-
(2003)
Thin Solid Films
, vol.430
, pp. 15-19
-
-
Wagner, S.1
Gleskova, H.2
Cheng, I.-C.3
Wu, M.4
-
11
-
-
78349273974
-
E-Beam Deposited Ultra-Smooth Silver Thin Film on Glass with Different Nucleation Layers: An Optimization Study for OLED Micro-Cavity Application
-
Melpignano, P.; Cioarec, C.; Clergereaux, R.; Gherardi, N.; Villeneuve, C.; Datas, L. E-Beam Deposited Ultra-Smooth Silver Thin Film on Glass with Different Nucleation Layers: An Optimization Study for OLED Micro-Cavity Application Org. Electron. 2010, 11, 1111-1119
-
(2010)
Org. Electron.
, vol.11
, pp. 1111-1119
-
-
Melpignano, P.1
Cioarec, C.2
Clergereaux, R.3
Gherardi, N.4
Villeneuve, C.5
Datas, L.6
-
12
-
-
84875227109
-
Illiberi, a.; Roozeboom, F. the Kinetics of Low-Temperature Spatial Atomic Layer Deposition of Aluminum Oxide
-
Poodt, P. Illiberi, a.; Roozeboom, F. The Kinetics of Low-Temperature Spatial Atomic Layer Deposition of Aluminum Oxide Thin Solid Films 2013, 532, 22-25
-
(2013)
Thin Solid Films
, vol.532
, pp. 22-25
-
-
Poodt, P.1
-
16
-
-
21744444606
-
Surface Chemistry of Atomic Layer Deposition: A Case Study for the Trimethylaluminum/water Process
-
Puurunen, R. L. Surface Chemistry of Atomic Layer Deposition: A Case Study for the Trimethylaluminum/water Process J. Appl. Phys. 2005, 97, 121301
-
(2005)
J. Appl. Phys.
, vol.97
, pp. 121301
-
-
Puurunen, R.L.1
-
17
-
-
84902243898
-
3 Thin Films Fabricated at Low Temperature via Atomic Layer Deposition on PEN Substrates
-
3 Thin Films Fabricated at Low Temperature via Atomic Layer Deposition on PEN Substrates Chem. Vap. Depos. 2014, 20, 1-7
-
(2014)
Chem. Vap. Depos.
, vol.20
, pp. 1-7
-
-
Choi, K.H.1
Ali, K.2
Kim, C.Y.3
Muhammad, N.M.4
-
18
-
-
79961236992
-
3, and ZnO Thin Films
-
3, and ZnO Thin Films J. Korean Phys. Soc. 2011, 59, 452
-
(2011)
J. Korean Phys. Soc.
, vol.59
, pp. 452
-
-
Taewook, N.1
Jae-Min, K.2
Min-Kyu, K.3
Hyungjun, K.4
Woo-Hee, K.5
-
19
-
-
84858028341
-
High Rate Roll-to-Roll Atomic Layer Deposition, and Its Application to Moisture Barriers on Polymer Films
-
Dickey, E.; Barrow, W. A. High Rate Roll-to-Roll Atomic Layer Deposition, and Its Application to Moisture Barriers on Polymer Films J. Vac. Sci. Technol. A Vacuum, Surfaces, Film. 2012, 30, 021502
-
(2012)
J. Vac. Sci. Technol. A Vacuum, Surfaces, Film.
, vol.30
, pp. 021502
-
-
Dickey, E.1
Barrow, W.A.2
-
20
-
-
84855612491
-
Low Temperature and Roll-to-Roll Spatial Atomic Layer Deposition for Flexible Electronics
-
Poodt, P.; Knaapen, R.; Illiberi, A.; Roozeboom, F.; van Asten, A. Low Temperature and Roll-to-Roll Spatial Atomic Layer Deposition for Flexible Electronics J. Vac. Sci. Technol. A Vacuum, Surfaces, Film. 2012, 30, 01A142
-
(2012)
J. Vac. Sci. Technol. A Vacuum, Surfaces, Film.
, vol.30
, pp. 01A142
-
-
Poodt, P.1
Knaapen, R.2
Illiberi, A.3
Roozeboom, F.4
Van Asten, A.5
-
21
-
-
84890314166
-
3 Layer by Roll-to-Toll Atomic Layer Deposition
-
3 Layer by Roll-to-Toll Atomic Layer Deposition Thin Solid Films 2014, 550, 164-169
-
(2014)
Thin Solid Films
, vol.550
, pp. 164-169
-
-
Hirvikorpi, T.1
Laine, R.2
Vähä-Nissi, M.3
Kilpi, V.4
Salo, E.5
Li, W.-M.6
Lindfors, S.7
Vartiainen, J.8
Kenttä, E.9
Nikkola, J.10
-
22
-
-
85008002412
-
Oxide Electronics by Spatial Atomic Layer Deposition
-
Levy, D.; Nelson, S.; Freeman, D. Oxide Electronics by Spatial Atomic Layer Deposition J. Dispersion Technol. 2009, 5, 484-494
-
(2009)
J. Dispersion Technol.
, vol.5
, pp. 484-494
-
-
Levy, D.1
Nelson, S.2
Freeman, D.3
-
23
-
-
84899992282
-
3 Thin Films Deposited on Polymeric Substrates by Atomic Layer Deposition with Perfluoropropane Plasma Treatment
-
3 Thin Films Deposited on Polymeric Substrates by Atomic Layer Deposition with Perfluoropropane Plasma Treatment Appl. Surf. Sci. 2014, 305, 554-561
-
(2014)
Appl. Surf. Sci.
, vol.305
, pp. 554-561
-
-
Ali, K.1
Choi, K.-H.2
Kim, C.Y.3
Doh, Y.H.4
Jo, J.5
-
25
-
-
84885156436
-
Atomic Layer Deposition of Noble Metals-New Developments in Nanostructured Catalysts
-
Su, Y. H. InTech: Croatia.
-
Lu, J.; Lei, Y.; Elam, J. W. Atomic Layer Deposition of Noble Metals, New Developments in Nanostructured Catalysts. In Nobel Metals; Su, Y. H., Ed.; InTech: Croatia, 2012.
-
(2012)
Nobel Metals
-
-
Lu, J.1
Lei, Y.2
Elam, J.W.3
-
26
-
-
84863795341
-
3 Thin Films Grown by Atomic Layer Deposition Efficiently at Room Temperature
-
3 Thin Films Grown by Atomic Layer Deposition Efficiently at Room Temperature Optoelectron. Adv. Mater.-Rapid Commun. 2012, 6, 618-622
-
(2012)
Optoelectron. Adv. Mater.-Rapid Commun.
, vol.6
, pp. 618-622
-
-
Shen, Y.1
Li, Y.2
Zhang, J.3
Zhu, X.I.A.4
Hu, Z.5
Chu, J.6
-
27
-
-
13444281994
-
3 Thin Films from a 1-Methoxy-2-methyl-2-propoxide Complex of Aluminum and Water
-
3 Thin Films from a 1-Methoxy-2-methyl-2-propoxide Complex of Aluminum and Water Chem. Mater. 2005, 17, 626-631
-
(2005)
Chem. Mater.
, vol.17
, pp. 626-631
-
-
Min, Y.1
Cho, Y.J.2
Hwang, C.S.3
-
28
-
-
79955040168
-
3 Thin Coatings for Corrosion Protection of Steel: Surface and Electrochemical Analysis
-
3 Thin Coatings for Corrosion Protection of Steel: Surface and Electrochemical Analysis Corros. Sci. 2011, 53, 2168-2175
-
(2011)
Corros. Sci.
, vol.53
, pp. 2168-2175
-
-
Diaz, B.1
Harkonen, E.2
Swiatowska, J.3
Maurice, V.4
Seyeux, A.5
Marcus, P.6
Ritala, M.7
-
29
-
-
33645719096
-
3 as Oxidant
-
3 as Oxidant J. Electrochem. Soc. 2006, 153, F69
-
(2006)
J. Electrochem. Soc.
, vol.153
, pp. 69
-
-
Kim, S.K.1
Lee, S.W.2
Hwang, C.S.3
Min, Y.-S.4
Won, J.Y.5
Jeong, J.6
-
30
-
-
76049092858
-
Atomic Layer Deposited Aluminum Oxide Barrier Coatings for Packaging Materials
-
Terhi, H.; Mika, V. N.; Tuomas, M.; Eero Liskola, M. K. Atomic Layer Deposited Aluminum Oxide Barrier Coatings for Packaging Materials Thin Solid Films 2010, 518, 2654-2658
-
(2010)
Thin Solid Films
, vol.518
, pp. 2654-2658
-
-
Terhi, H.1
Mika, V.N.2
Tuomas, M.3
Eero Liskola, M.K.4
-
33
-
-
0032475562
-
2 in Vitreous Silica, Qualitative and Quantitative Determination from Raman and Infrared Spectroscopy
-
2 in Vitreous Silica, Qualitative and Quantitative Determination from Raman and Infrared Spectroscopy J. Non.-Cryst. Solids 1998, 240, 91-103
-
(1998)
J. Non.-Cryst. Solids
, vol.240
, pp. 91-103
-
-
Schmidt, B.C.1
Holtz, F.M.2
Beny, J.3
-
34
-
-
84863118994
-
3 Thin Films in Magnetized Radio Frequency Plasma Source
-
3 Thin Films in Magnetized Radio Frequency Plasma Source Phys. Procedia 2011, 18, 100-106
-
(2011)
Phys. Procedia
, vol.18
, pp. 100-106
-
-
Li, X.1
Chen, Q.2
Sang, L.3
Yang, L.4
Liu, Z.5
Wang, Z.6
-
35
-
-
78149416516
-
2 Hybrid: Geometrical Approach to Create High Contact Angle Surface from Low Contact Angle Materials
-
2 Hybrid: Geometrical Approach to Create High Contact Angle Surface from Low Contact Angle Materials J. Sol-Gel Sci. Technol. 2010, 56, 47-52
-
(2010)
J. Sol-Gel Sci. Technol.
, vol.56
, pp. 47-52
-
-
Damayanti, N.P.1
-
37
-
-
64349109641
-
3 Atomic Layer Deposition with Trimethylaluminum and Ozone Studied by in Situ Transmission FTIR Spectroscopy and Quadrupole Mass Spectrometry
-
3 Atomic Layer Deposition with Trimethylaluminum and Ozone Studied by in Situ Transmission FTIR Spectroscopy and Quadrupole Mass Spectrometry J. Phys. Chem. C 2008, 112, 19530-19539
-
(2008)
J. Phys. Chem. C
, vol.112
, pp. 19530-19539
-
-
Goldstein, D.N.1
McCormick, J.A.2
George, S.M.3
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