Hydrophobicity enhancement of Al2O3 thin films deposited on polymeric substrates by atomic layer deposition with perfluoropropane plasma treatment

Applied Surface Science

Volumn 305, Issue , 2014, Pages 554-561

  Ali, Kamran ^a   Choi, Kyung Hyun ^a   Kim, Chang Young ^a   Doh, Yang Hoi ^a   Jo, Jeongdai ^b  

^a Jeju National University   (South Korea)

^b Korea Institute of Machine and Materials   (South Korea)

Author keywords

Atomic layer deposition; Contact angle; Hydrophobicity; PEN

Indexed keywords

ALUMINA; ALUMINUM OXIDE; ATOMIC LAYER DEPOSITION; ATOMS; CONTACT ANGLE; HYDROPHOBICITY; LIFE CYCLE; OPTICAL PROPERTIES; ORGANIC LIGHT EMITTING DIODES (OLED); PLASMA APPLICATIONS; SUBSTRATES; WATER VAPOR;

BARRIER COATINGS; BARRIER FILMS; ELECTRONIC DEVICE; OPTOELECTRONICS DEVICES; PERFLUOROPROPANE; PLASMA TREATMENT; POLYETHYLENE NAPHTHALATE; POLYMERIC SUBSTRATE;

THIN FILMS;

EID: 84899992282     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2014.03.135     Document Type: Article

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