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Journal of Materials Science: Materials in Electronics

Volumn 25, Issue 4, 2014, Pages 1922-1932

Characterization of Al2O3 thin films fabricated through atomic layer deposition on polymeric substrates

(3) Ali, Kamran a Kim, Chang Young a Choi, Kyung Hyun a

a Jeju National University (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION; BINDING ENERGY; CARBON FILMS; DEPOSITION; FABRICATION; POLYMERS; SUBSTRATES; THIN FILMS;

CARBON CONTAMINATION; DEPOSITION TEMPERATURES; INSULATING PROPERTIES; OPTICAL CHARACTERISTICS; POLYAMIDE SUBSTRATES; POLYETHYLENE NAPHTHALATE; POLYETHYLENE TEREPHTHALATES (PET); POLYMERIC SUBSTRATE;

ALUMINUM;

EID: 84897106723 PISSN: 09574522 EISSN: 1573482X Source Type: Journal
DOI: 10.1007/s10854-014-1821-6 Document Type: Article

Times cited : (10)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.