A novel 2D dynamic cellular automata model for photoresist etching process simulation

Journal of Micromechanics and Microengineering

Volumn 15, Issue 3, 2005, Pages 652-662

  Zhou, Zai Fa ^a   Huang, Qing An ^a   Li, Wei Hua ^a   Lu, Wei ^a  

^a Southeast University   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AMPLIFICATION; COMPUTER AIDED DESIGN; COMPUTER SIMULATION; ETCHING; FABRICATION; INTEGRATED CIRCUITS; MICROELECTROMECHANICAL DEVICES;

ETCH RATES; FLUCTUATIONS; PHOTO-COATED WAFERS; PHOTORESIST ETCHING PROCESS SIMULATION; TWO-DIMENSIONAL (2D) DYNAMIC CELLULAR AUTOMATA (CA) MODEL;

PHOTORESISTS;

EID: 15544379292     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/15/3/029     Document Type: Article

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