A Monte Carlo simulation model for surface evolution by plasma etching

Applied Surface Science

Volumn 280, Issue , 2013, Pages 655-659

  Chen, Fangfang ^a   Zhu, Kaigui ^a   Chen, Aqing ^a   Huang, Weijie ^a   Feng, Lishuang ^a   Zhou, Zhen ^a   Ge, Guanglu ^b  

^a BEIHANG UNIVERSITY   (China)

^b NATIONAL CENTER FOR NANOSCIENCE AND TECHNOLOGY   (China)

Author keywords

Monte Carlo method; Plasma etching; Simulation; Surface morphology

Indexed keywords

FRACTALS; INTELLIGENT SYSTEMS; MORPHOLOGY; PLASMA ETCHING; SURFACE MORPHOLOGY;

ETCH MODEL; FRACTAL EXPONENTS; MORPHOLOGY EVOLUTION; SIMULATION; SURFACE EVOLUTION;

MONTE CARLO METHODS;

EID: 84879696461     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2013.04.171     Document Type: Article

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