Fundamental mechanisms of oxygen plasma-induced damage of ultralow- k organosilicate materials: The role of thermal 3P atomic oxygen

Applied Physics Letters

Volumn 94, Issue 20, 2009, Pages

  Chaudhari, Mrunalkumar ^a   Du, Jincheng ^a   Behera, Swayambhu ^a   Manandhar, Sudha ^a   Gaddam, Sneha ^a   Kelber, Jeffry ^a  

^a UNIVERSITY OF NORTH TEXAS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AB INITIO; ATOMIC OXYGEN; BOND FORMATION; CARBON LOSS; CHEMICAL CHANGE; EX SITU; IN-SITU; KINETIC BARRIER; MOLECULAR DYNAMICS SIMULATIONS; ORGANOSILICATE FILMS; ORGANOSILICATE MATERIALS; OXYGEN PLASMAS; PLASMA EXPOSURE; SI-C BOND; SURFACE REGION; ULTRALOW-K;

CHEMICAL BONDS; DENSITY FUNCTIONAL THEORY; DYNAMICS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MOLECULAR DYNAMICS; MOLECULAR SPECTROSCOPY; OXYGEN; PLASMAS; REACTION KINETICS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 65949106812     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3134487     Document Type: Article

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