Controllable doping and wrap-around contacts to electrolessly etched silicon nanowire arrays

Nanotechnology

Volumn 25, Issue 37, 2014, Pages

  Sadhu, Jyothi S ^a   Tian, Hongxiang ^a   Spila, Timothy ^b   Kim, Junhwan ^a   Azeredo, Bruno ^a   Ferreira, Placid ^a   Sinha, Sanjiv ^a  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

^b University of Illinois at Urbana Champaign   (United States)

Author keywords

electrical contacts; metal assisted chemical etching; silicon nanowire arrays

Indexed keywords

ELECTRIC CONTACTS; ETCHING; NANOWIRES; SECONDARY ION MASS SPECTROMETRY; SILICIDES;

DOPANT CONCENTRATIONS; ELECTRICAL CONTACTS; ELECTRICAL MEASUREMENT; ELECTROLESS CHEMICAL ETCHING; METAL-ASSISTED CHEMICAL ETCHING; SECONDARY ION MASS SPECTROSCOPY; SILICON NANOWIRE ARRAYS; SPECIFIC CONTACT RESISTIVITY;

SILICON WAFERS;

EID: 84906655906     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/25/37/375701     Document Type: Article

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