High resolution X-ray and electron microscopy characterization of PZT thin films prepared by RF magnetron sputtering

Applied Surface Science

Volumn 313, Issue , 2014, Pages 196-206

  Maurya, K K ^a   Halder, S K ^a   Sen, Suchitra ^b   Bose, Ankita ^b   Bysakh, Sandip ^b  

^a NATIONAL PHYSICAL LABORATORY   (India)

^b CSIR CENTRAL GLASS AND CERAMIC RESEARCH INSTITUTE   (India)

Author keywords

Cross sectional transmission electron microscopy; Perovskite phase; PZT; Residual stress; RF sputtering; X ray reflectometry

Indexed keywords

ELECTRONS; FERROELECTRIC FILMS; FERROELECTRICITY; LEAD COMPOUNDS; MAGNETRON SPUTTERING; MICROSTRUCTURE; NANOTECHNOLOGY; PEROVSKITE; REFLECTION; REFLECTOMETERS; RESIDUAL STRESSES; SILICON; TRANSMISSIONS; ULTRATHIN FILMS; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS; ZIRCONIUM COMPOUNDS;

CROSS SECTIONAL TRANSMISSION ELECTRON MICROSCOPY; GRAZING INCIDENCE X-RAY DIFFRACTION; HIGH RESOLUTION X RAY DIFFRACTION; PB(ZR0.52TI0.48)O3 THIN FILMS; PEROVSKITE PHASE; RADIO FREQUENCY MAGNETRON SPUTTERING; RF-SPUTTERING; X-RAY REFLECTOMETRY;

HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY;

EID: 84904814589     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2014.05.184     Document Type: Article

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