Influence of plasma pressure on the growth characteristics and ferroelectric properties of sputter-deposited PZT thin films

Applied Surface Science

Volumn 256, Issue 21, 2010, Pages 6205-6212

  Bose, A ^a   Maity, T ^a   Bysakh, S ^a   Seal, A ^a   Sen, Suchitra ^a  

^a CSIR CENTRAL GLASS AND CERAMIC RESEARCH INSTITUTE   (India)

Author keywords

Electron microscopy; Ferroelectricity; PZT; Sputtering; Thin films

Indexed keywords

AMORPHOUS FILMS; ELECTRIC FIELDS; ELECTRODES; ELECTRON MICROSCOPY; ELECTRONS; FERROELECTRIC FILMS; FERROELECTRICITY; FIELD EMISSION MICROSCOPES; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; HYSTERESIS; HYSTERESIS LOOPS; INTERFACES (MATERIALS); LEAD ZIRCONATE TITANATE; MAGNETRON SPUTTERING; MICROSTRUCTURE; NANOPROBES; PEROVSKITE; POLARIZATION; SCANNING ELECTRON MICROSCOPY; SPUTTERING; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

CROSS-SECTIONAL TRANSMISSION ELECTRON MICROSCOPY; FERROELECTRIC PEROVSKITES; FIELD EMISSION SCANNING ELECTRON MICROSCOPY; GRANULAR MICROSTRUCTURE; MULTILAYERED SUBSTRATES; PREFERRED ORIENTATIONS; RADIO FREQUENCY MAGNETRON SPUTTERING; SATURATION POLARIZATION;

THIN FILMS;

EID: 77953139045     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2010.03.142     Document Type: Article

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