Effects of thermal annealing on the structure of ferroelectric thin films

Journal of the American Ceramic Society

Volumn 89, Issue 4, 2006, Pages 1321-1325

  Cao, Jiang Li ^a,b   Solbach, Axel ^a   Klemradt, Uwe ^a   Weirich, Thomas ^a   Mayer, Joachim ^a   Böttger, Ulrich ^a   Ellerkmann, Ulrich ^a   Schorn, Peter J ^a   Gerber, Peter ^a   Waser, Rainer ^a  

^a RWTH AACHEN UNIVERSITY   (Germany)

^b UNIVERSITY OF NOTTINGHAM   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; DEPOSITION; POLYCRYSTALLINE MATERIALS; SYNCHROTRON RADIATION; TRANSMISSION ELECTRON MICROSCOPY;

CHEMICAL SOLUTION DEPOSITION; ELEMENT DIFFUSIONS; THERMAL ANNEALING;

FERROELECTRIC THIN FILMS;

EID: 33645132510     PISSN: 00027820     EISSN: 15512916     Source Type: Journal    
DOI: 10.1111/j.1551-2916.2005.00885.x     Document Type: Article

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