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Volumn 14, Issue SUPPL. 1, 2014, Pages

Effects of temperature-induced stress on the structural, electrical, and optical properties of ZnO:Ga thin films grown on Si substrates

(4) Hwang, Younghun a Park, Seungmin a Kang, Manil a Um, Youngho a

a University of Ulsan (South Korea)

Author keywords

Electronic structure; Optical properties; Sputtering; Thin films; X ray diffraction

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRONIC STRUCTURE; GALLIUM; GROWTH TEMPERATURE; OPTICAL PROPERTIES; SILICON; SPECTROSCOPIC ELLIPSOMETRY; SPUTTERING; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION; ZINC OXIDE;

ELECTRICAL TRANSPORT; LOW TEMPERATURES; REACTIVE MAGNETRON SPUTTERING; RESIDUAL COMPRESSIVE STRESS; SI (001) SUBSTRATE; SPECTROSCOPIC ELLIPSOMETRY MEASUREMENTS; SUBSTRATE TEMPERATURE; TEMPERATURE-INDUCED;

GALLIUM ALLOYS;

EID: 84899439336 PISSN: 15671739 EISSN: None Source Type: Journal
DOI: 10.1016/j.cap.2013.11.048 Document Type: Article

Times cited : (6)

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