Rapid thermal annealing effects on the structural and optical properties of ZnO films deposited on Si substrates

Journal of Luminescence

Volumn 129, Issue 2, 2009, Pages 148-152

  Lee, Yueh Chien ^a   Hu, Sheng Yao ^b   Water, Walter ^c   Tiong, Kwong Kau ^d   Feng, Zhe Chuan ^e   Chen, Yen Ting ^e   Huang, Jen Ching ^a   Lee, Jyh Wei ^a   Huang, Chia Chih ^a   Shen, Jyi Lai ^a   Cheng, Mou Hong ^a  

^a TUNGNAN UNIVERSITY   (Taiwan)

^b TUNG FANG INSTITUTE OF TECHNOLOGY   (Taiwan)

^c NATIONAL FORMOSA UNIVERSITY   (Taiwan)

^d NATIONAL TAIWAN OCEAN UNIVERSITY   (Taiwan)

^e NATIONAL TAIWAN UNIVERSITY   (Taiwan)

Author keywords

Annealing; Photoluminescence; X ray diffraction; Zinc oxide

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; CRYSTAL ATOMIC STRUCTURE; DIFFRACTION; ELECTROMAGNETIC WAVES; LIGHT; LIGHT EMISSION; LUMINESCENCE; METALLIC FILMS; MICROSCOPIC EXAMINATION; OPTICAL MATERIALS; OPTICAL MICROSCOPY; OPTICAL PROPERTIES; PHOTOLUMINESCENCE; RAPID THERMAL ANNEALING; RAPID THERMAL PROCESSING; SEMICONDUCTING ZINC COMPOUNDS; SILICON; SUBSTRATES; X RAY ANALYSIS; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS; ZINC; ZINC ALLOYS; ZINC OXIDE;

AFM IMAGES; ATOMIC FORCES; DIFFRACTION PEAKS; FILM SURFACES; GRAIN SIZES; PHOTOLUMINESCENCE MEASUREMENTS; PL SPECTRUMS; RESIDUAL COMPRESSIVE STRESSES; SI SUBSTRATES; THERMAL ANNEALING; UV LUMINESCENCES; X-RAY DIFFRACTIONS; XRD SPECTRUMS; ZNO FILMS;

OPTICAL FILMS;

EID: 55749095380     PISSN: 00222313     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jlumin.2008.09.003     Document Type: Article

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