Effects of hydrogen dilution on CNx film properties deposited using rf PECVD from a mixture of ethane, nitrogen and hydrogen

Materials Chemistry and Physics

Volumn 144, Issue 3, 2014, Pages 377-384

  Othman, Maisara ^a   Ritikos, Richard ^a   Khanis, Noor Hamizah ^a   Rashid, Nur Maisarah Abdul ^a   Gani, Siti Meriam Ab ^a   Rahman, Saadah Abdul ^a  

^a UNIVERSITY OF MALAYA   (Malaysia)

Author keywords

Auger electron spectroscopy (AES); Chemical vapour deposition (CVD); Fourier transform infrared spectroscopy (FTIR); Raman spectroscopy and scattering; Thin film

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CARBON FILMS; CARBON NITRIDE; CHEMICAL BONDS; ETHANE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROGEN; MIXTURES; NITROGEN; NITROGEN PLASMA; PLASMA CVD; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THIN FILMS;

AUGER ELECTRON SPECTROSCOPIES (AES); CHEMICAL BONDINGS; CHEMICAL VAPOUR DEPOSITION; FILMS PROPERTIES; HYDROGEN DILUTION; RADIO FREQUENCY PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITIONS; RAMAN SPECTROSCOPY AND SCATTERING; STANDARD CUBIC CENTIMETERS PER MINUTE (SCCM);

GROWTH RATE;

EID: 84894520077     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2014.01.005     Document Type: Article

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