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Volumn 349, Issue 1-2, 1999, Pages 115-119

Infrared absorption spectroscopy measurements of amorphous CNx films prepared in CH4/N2 r.f. discharge

Author keywords

Amorphous materials; Infrared spectroscopy; Nitrides; Plasma processing and deposition

Indexed keywords

CHEMICAL BONDS; DEPOSITION; INFRARED SPECTROSCOPY; METHANE; NITRIDES; NITROGEN;

INFRARED ABSORPTION SPECTROSCOPY;

AMORPHOUS FILMS;

EID: 0032607393 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(99)00237-0 Document Type: Article

Times cited : (69)

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