Effect of N2 flow rate on the properties of CNx thin films prepared by radio frequency plasma enhanced chemical vapor deposition from ethane and nitrogen

Thin Solid Films

Volumn 529, Issue , 2013, Pages 439-443

  Othman, Maisara ^a   Ritikos, Richard ^a   Khanis, Noor Hamizah ^a   Rashid, Nur Maisarah Abdul ^a   Gani, Siti Meriam Ab ^a   Rahman, Saadah Abdul ^a  

^a UNIVERSITY OF MALAYA   (Malaysia)

Author keywords

Carbon nitride; N incorporation; Photoluminescence; Plasma enhanced chemical vapor deposition

Indexed keywords

FILM POROSITY; HYDROCARBON MIXTURE; N INCORPORATION; NITROGEN INCORPORATION; PHOTOLUMINESCENCE INTENSITIES; PL PROPERTY; RADIO FREQUENCY PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITIONS;

CARBON; CARBON NITRIDE; DEPOSITS; ETHANE; FLOW RATE; METHANE; MIXTURES; OPTICAL PROPERTIES; ORGANIC COMPOUNDS; PHOTOLUMINESCENCE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THIN FILMS; VAPORS; WAVE PLASMA INTERACTIONS;

NITROGEN;

EID: 84873742663     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2012.03.090     Document Type: Conference Paper

References (32)

1. G. Fanchini, P. Mandracci, A. Tagliaferro, S.E. Rodil, A. Vomiero, and G. Della Mea Diamond Relat. Mater. 14 2005 928
2. J. Robertson Mater. Sci. Eng. R37 2002 129
3. E.F. Motta, and I. Pereyra J. Non-Cryst. Solids 338-340 2004 525
4. A.Y. Liu, and M.L. Cohen Science 245 1989 841
5. A.Y. Liu, and M.L. Cohen Phys. Rev. B 41 1990 10727
6. K.H. Lee, R. Ohta, H. Sugimura, Y. Inoue, O. Takai, and H. Sugimura Thin Solid Films 475 2005 308
7. T. Katsuno, S. Nitta, and H. Habushi Diamond Relat. Mater. 11 2002 1215
8. M. Aono, and S. Nitta Diamond Relat. Mater. 11 2003 1219
9. N. Mutsukura, and K.-I. Akita Diamond Relat. Mater. 9 3 2000 761
10. N. Mutsukura Diamond Relat. Mater. 10 3-7 2001 1152
11. M. Zhang, Y. Nakayama, and S. Harada J. Appl. Phys. 86 1999 4971
12. R. Ritikos, C.C. Siong, S.M.A. Gani, M.R. Muhamad, and S.A. Rahman Jpn. J. Appl. Phys. 48 2009 101301
13. R. Ritikos, B.T. Goh, K.A.M. Sharif, M.R. Muhamad, and S.A. Rahman Thin Solid Films 517 2009 5092
14. M. Othman, R. Ritikos, N.H. Khanis, N.M.A. Rashid, S.A. Rahman, S.M.A. Gani, and M.R. Muhamad Thin Solid Films 519 2011 4981
15. L. Valentini, J.M. Kenny, Y. Gerbig, A. Savan, H. Haefke, L. Lozzi, and S. Santucci Thin Solid Films 398-399 2001 124
16. A.P. Ehiasarian, R. New, W.-D. Munz, L. Hultman, U. Helmersson, and V. Kouznetsov Vacuum 65 2002 147
17. K. Jiang, K. Sarakinos, S.K. Stontinidis, and J.M. Schneider J. Phys. D: Appl. Phys. 43 2010 325202 (6pp)
18. J.-C. Legrand, A.-M. Diamy, R. Hrach, and V. Hrachova Vacuum 52 1999 27
19. N. Mutsukura, and K. Akita Thin Solid Films 349 1999 115
20. G. Fanchini, S.C. Ray, and A. Tagliaferro Diamond Relat. Mater. 12 2003 1084
21. R. Gharbi, M. Fathallah, N. Alzaied, E. Tresso, and A. Tagliaferro Mater. Sci. Eng. C 28 2008 795
22. V.S. Veerasamy, J. Yuan, G.A.J. Amaratunga, W.I. Milne, K.W.R. Gilkes, M. Weiler, and L.M. Brown Phys. Rev. B 48 1993 17954
23. J.K. Walters, M. Kuhn, C. Spaeth, E. Dooryhee, and R.J. Newport J. Appl. Phys. 83 1998 3259
24. B. Kleinsorge, A.C. Ferrari, J. Robertson, W.I. Milne, S. Waidmann, and S. Hearne Diamond Relat. Mater. 9 2000 632
25. G. Mariotto, F.L. Freire Jr., and C.A. Achete Thin Solid Films 241 1994 255
26. A. Ilie, O. Harel, N.M.J. Conway, T. Yagi, J. Robertson, and W.I. Milne J. Appl. Phys. 87 2000 2
27. J. Robertson, and C.A. Davis Diamond Relat. Mater. 4 1995 441
28. Y.K. Yap, S. Kida, T. Aoyama, Y. Mori, and T. Sasaki Appl. Phys. Lett. 73 1998 915
29. N. Hellgren, M.P. Johanson, E. Broitman, L. Hultman, and J.-E. Sundgren Phys. Rev. B 59 2000 5162
30. G. Fanchini, A. Tagliaferro, N.M.J. Conway, and C. Godet Phys. Rev. B 66 19 2002 1954151
31. Stephen Muhl, and Juan Manuel Méndez Diamond Relat. Mater. 8 10 1999 1809
32. G. Fanchini, S.C. Ray, A. Tagliaferro, and E. Laurenti Diamond Relat. Mater. 11 3-6 2002 1143