The change of photoluminescence characteristics of amorphous carbon films due to hydrogen dilution

Journal of Non-Crystalline Solids

Volumn 338-340, Issue 1 SPEC. ISS., 2004, Pages 481-485

  Xu, Jun ^a,b   Mei, Jiaxin ^a   Huang, Xiaohui ^a   Li, Wei ^a   Li, Zhifeng ^b   Li, Xin ^a   Chen, Kunji ^a  

^a NANJING UNIVERSITY   (China)

^b SHANGHAI INSTITUTE OF TECHNICAL PHYSICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROGEN; HYDROGENATION; OPTOELECTRONIC DEVICES; PHOTOLUMINESCENCE; PHOTONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SCATTERING; RAMAN SPECTROSCOPY; SILICON WAFERS; ULTRAVIOLET RADIATION;

AMORPHOUS CARBON FILMS; HYDROGEN DILUTION; OPTICAL BAND GAP; PEAK ENERGY;

AMORPHOUS FILMS;

EID: 2942562345     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2004.03.024     Document Type: Conference Paper

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