Optical investigations of the microstructure of carbon nitride films deposited by magnetron sputtering

Surface and Coatings Technology

Volumn 151-152, Issue , 2002, Pages 242-246

  Lejeune, M ^a   Durand Drouhin, O ^a   Ballutaud, D ^b   Benlahsen, M ^a  

^a Universite de Picardie Jules Verne   (France)

^b Centre National de la Recherche Scientifique   (France)

Author keywords

Carbon nitride; Disordered systems; Optical properties; Thin films

Indexed keywords

CHEMICAL BONDS; CRYSTAL MICROSTRUCTURE; INFRARED SPECTROSCOPY; MAGNETRON SPUTTERING; RAMAN SCATTERING; SILICON WAFERS; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

PHOTOTHERMAL DEFLECTION SPECTROSCOPY (PDS);

CARBON NITRIDE;

CARBON NITRIDE; FILM; MICROSTRUCTURE; OPTICAL TECHNIQUE; SPUTTERING;

EID: 17444437210     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(01)01659-0     Document Type: Article

References (20)