Effect of pre-deposited carbon layer on the formation of carbon nitride nanostructures prepared by radio-frequency plasma enhanced chemical vapour deposition

Materials Chemistry and Physics

Volumn 130, Issue 1-2, 2011, Pages 218-222

  Khanis, Noor Hamizah ^a   Ritikos, Richard ^a   Othman, Maisara ^a   Rashid, Nur Maisarah Abdul ^a   Gani, Siti Meriam Ab ^a   Muhamad, Muhamad Rasat ^a   Rahman, Saadah Abdul ^a  

^a UNIVERSITY OF MALAYA   (Malaysia)

Author keywords

Chemical vapour deposition (CVD); Electron microscopy (SEM); Fourier transform infrared spectroscopy (FTIR); Nanostructures

Indexed keywords

A-C:H FILMS; C-SI SUBSTRATES; CARBON LAYERS; CHEMICAL BONDINGS; CHEMICAL VAPOUR DEPOSITION; CRYSTAL SILICON; DEPOSITION TIME; FOURIER TRANSFORM INFRARED; FTIR; HYDROGENATED AMORPHOUS CARBON (A-C:H); NANOSTRUCTURE GROWTH; NANOSTRUCTURED CARBONS; NITRIDE NANOSTRUCTURES; RADIO FREQUENCY PLASMA; RF-PECVD; VERTICAL ALIGNMENT; VERTICALLY ALIGNED;

AMORPHOUS CARBON; AMORPHOUS FILMS; AMORPHOUS SILICON; CARBON FILMS; CARBON NITRIDE; CHEMICAL BONDS; COATINGS; DEPOSITION; ELECTRIC DISCHARGES; FILM PREPARATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; METHANE; MORPHOLOGY; NANOSTRUCTURES; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SUBSTRATES; SURFACE MORPHOLOGY;

CHEMICAL VAPOR DEPOSITION;

EID: 80052561911     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2011.06.030     Document Type: Article

References (21)

1. Y.S. Park, H.S. Myung, J.G. Han, and B. Hong Thin Solid Films 475 2005 298
2. X.W. Liu, J.H. Lin, W.J. Hsieh, and H.C. Shih Diamond Relat. Mater. 11 2002 1193
3. S.L. Sung, C.H. Tseng, X.J. Guo, F.K. Chiang, X.W. Liu, and H.C. Shih Thin Solid Films 340 1999 169
4. H. Ito, T. Nozaki, A. Saikubo, N. Yamada, K. Kanda, M. Niibe, and H. Saitoh Thin Solid Films 516 2008 6575
5. X.W. Liu, J.H. Lin, L.T. Chao, and H.C. Shih Mater. Lett. 44 2000 304
6. G.A.J. Amaratunga, and S.R.P. Silva J. Non-Cryst. Solids 198-200 1996 611
7. A. Okita, Y. Suda, A. Oda, J. Nakamura, A. Ozeki, K. Bhattacharyya, H. Sugawara, and Y. Sakai Carbon 45 2007 1518
8. P. Ayala, R. Arenal, M. Rummeli, A. Rubio, and T. Pichler Carbon 48 2010 575
9. A. Rizzo, R. Rossi, M.A. Signore, E. Piscopiello, L. Capodieci, R. Pentassuglia, T. Dikonimos, and R. Giorgi Diamond Relat. Mater. 17 2008 1502
10. A.V. Melechko, V.I. Merkulov, D.H. Lowndes, M.A. Guillorn, and M.L. Simpson Chem. Phys. Lett. 356 2002 527
11. K.H. Park, J.H. Yim, S. Lee, and K.H. Koh Thin Solid Films 501 2006 233
12. L.M. Franco, J.A. Perez, and H. Riascos Microelectron. J. 39 2008 1363
13. R. Zhang, M. Hummelgard, and H. Olin Carbon 48 2010 424
14. Z. Zhang, P. He, Z. Sun, T. Feng, Y. Chen, H. Li, and B. Tay Appl. Surf. Sci. 256 2010 4417
15. R. Ritikos, S.A. Rahman, S.M.A. Gani, and M.R. Muhamad Carbon 2011 1842
16. C. Wang, S. Yang, and J. Zhang J. Non-Cryst. Solids 354 2008 1608
17. R. Ritikos, C.S. Chow, S.M. Gani Ab, M.R. Muhamad, and S.A. Rahman Jpn. J. Appl. Phys. 48 2009 101301
18. I.K. Song, Y.S. Cho, G.S. Choi, J.B. Park, and D.J. Kim Diamond Relat. Mater. 13 2004 1210
19. N. Mutsukura Diamond Relat. Mater. 10 2001 1152
20. N. Mutsukura, and K.-i. Akita Diamond Relat. Mater. 8 1999 1720
21. S. Muhl, and J.M. Me'ndez Diamond Relat. Mater. 8 1999 1809