Chemical analysis of pulsed laser deposited a-CNx films by comparative infrared and X-ray photoelectron spectroscopies

Surface and Coatings Technology

Volumn 125, Issue 1-3, 2000, Pages 308-312

  Szorenyi T ^a   Fuchs, C ^a   Fogarassy, E ^a   Hommet, J ^b   Le Normand, F ^b  

^a UMR 7005   (France)

^b INSTITUT DE PHYSIQUE ET CHIMIE DES MATÉRIAUX DE STRASBOURG   (France)

Author keywords

Carbon nitride; Infrared (IR) absorption spectroscopy; Pulsed laser deposition; X ray photoelectron spectroscopy (XPS)

Indexed keywords

ABSORPTION SPECTROSCOPY; CARBON INORGANIC COMPOUNDS; CHEMICAL BONDS; DEPOSITION; INFRARED SPECTROSCOPY; LASER BEAM EFFECTS; NITRIDES; PRESSURE EFFECTS; PULSED LASER APPLICATIONS; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON NITRIDE; PULSED LASER DEPOSITION (PLD);

AMORPHOUS FILMS;

CARBONITRIDING; DEPOSITION; FILM; LASER;

EID: 0034054395     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00580-0     Document Type: Article

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