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Volumn 383-390, Issue , 2012, Pages 3298-3304
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Effect of hydrogen on the properties of amorphous carbon nitride films
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Author keywords
AFM; Hydrogenated a CNx films; R.F. Magnetron sputtering; Residual stress; SLEEM; TDMS; XPS
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Indexed keywords
AFM;
AMORPHOUS CARBON NITRIDE FILMS;
EFFECT OF HYDROGEN;
LOW ENERGY ELECTRON MICROSCOPY;
MAGNETRON SPUTTERING DEVICE;
NITROGEN CONTENT;
NITROGEN DISCHARGES;
R.F. MAGNETRON SPUTTERING;
SI SUBSTRATES;
SLEEM;
TDMS;
THERMAL DESORPTION MASS SPECTROSCOPIES;
AMORPHOUS CARBON;
AMORPHOUS SILICON;
ATOMIC FORCE MICROSCOPY;
ATOMIC SPECTROSCOPY;
CARBON FILMS;
CARBON NITRIDE;
COPPER;
HYDROGEN;
MANUFACTURE;
MASS SPECTROMETRY;
RESIDUAL STRESSES;
TECHNOLOGY;
THERMAL DESORPTION;
X RAY PHOTOELECTRON SPECTROSCOPY;
X RAY TUBES;
AMORPHOUS FILMS;
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EID: 83755174023
PISSN: 10226680
EISSN: None
Source Type: Book Series
DOI: 10.4028/www.scientific.net/AMR.383-390.3298 Document Type: Conference Paper |
Times cited : (2)
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References (17)
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