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Volumn 383-390, Issue , 2012, Pages 3298-3304

Effect of hydrogen on the properties of amorphous carbon nitride films

Author keywords

AFM; Hydrogenated a CNx films; R.F. Magnetron sputtering; Residual stress; SLEEM; TDMS; XPS

Indexed keywords

AFM; AMORPHOUS CARBON NITRIDE FILMS; EFFECT OF HYDROGEN; LOW ENERGY ELECTRON MICROSCOPY; MAGNETRON SPUTTERING DEVICE; NITROGEN CONTENT; NITROGEN DISCHARGES; R.F. MAGNETRON SPUTTERING; SI SUBSTRATES; SLEEM; TDMS; THERMAL DESORPTION MASS SPECTROSCOPIES;

EID: 83755174023     PISSN: 10226680     EISSN: None     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/AMR.383-390.3298     Document Type: Conference Paper
Times cited : (2)

References (17)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.