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J. M. Shaw, D. D. Gelorme, N. C. LaBianca, W. E. Conlye, and S. J. Holmes, "Negative photoresists for optical lithography," IBM J. Res. Develop., vol. 41, no. 1.2, pp. 81-94, Jan. 1997. (Pubitemid 127580528)
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(1997)
IBM Journal of Research and Development
, vol.41
, Issue.1-2
, pp. 81-94
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Shaw, J.M.1
Gelorme, J.D.2
LaBianca, N.C.3
Conley, W.E.4
Holmes, S.J.5
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