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Journal of Micromechanics and Microengineering

Volumn 22, Issue 7, 2012, Pages

Manipulation of exposure dose parameters to improve production of high aspect ratio structures using SU-8

(3) Daunton, R a Gallant, A J a Wood, D a

a DURHAM UNIVERSITY (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

DARK FIELD; EXPOSURE DOSE; FABRICATION PROCESS; HIGH ASPECT RATIO STRUCTURES; MASK DESIGN; PHOTOACTIVE COMPOUNDS; POLYMERIZATION RATES; SIDEWALL PROFILES;

PHOTORESISTS;

X RAY LITHOGRAPHY;

EID: 84863835427 PISSN: 09601317 EISSN: 13616439 Source Type: Journal
DOI: 10.1088/0960-1317/22/7/075016 Document Type: Article

Times cited : (14)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.